磁渣清洗工艺优化对倒装球栅阵列可靠性的影响

Y. B. Kar, Noor Azrma Tahk, Foong Chee Seng, L. H. Yang, R. Vithyacharan, T. Yong
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引用次数: 1

摘要

本文对倒装晶片陶瓷球栅阵列(FCCBGA)封装上有机残留物的清洗性能进行了评价和表征。在组装过程中,用于控制崩溃芯片连接(C4)的焊剂可能会作为有机残留物留在模具表面,从而影响集成电路的性能。因此,评价了助熔剂清洗工艺对模具清洁度的影响。采用水基溶剂清洗化学参数的实验设计(DOE)研究了通量清洗效率。对所进行的实验的响应是模具表面清洁度。使用扫描电子显微镜(SEM)、傅里叶变换红外光谱(FTIR)和离子色谱(IC)分析和表征污染物的存在和水平。优化过程需要机械参数和化学参数的整合。以微相清洗(MPC)为溶剂,对化学清洗参数进行优化。通过改变洗涤温度和溶剂浓度来寻找最佳的清洗方法。而对于机械参数,洗涤压力和喷嘴方向是会对清洗过程产生影响的预期参数。通过实验,优化了清洗工艺,将3%的MPC溶剂加入到纯去离子水中,清洗时间延长0.3 m/mm, 10psi, 75℃。通过热循环测试证明了优化结果,即使在2500x之后也没有检测到任何堵塞或空洞。
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Flux residue cleaning process optimization effect on Flip Chip Ball Grid Array reliability
This paper discusses the evaluation and characterizations of the cleaning the organic residues on Flip Chip Ceramic Ball Grid Array (FCCBGA) package. Flux used for Control Collapse Chip Connection (C4) die attachment during assemblies could remain on the die surface as organic residues, thus affecting the integrated circuit performance. Therefore, the effect of implementation flux-cleaning process on the die cleanliness was evaluated. Design of Experiments (DOE) for cleaning chemical parameters using water-based solvents was carried out to investigate the flux-cleaning efficiency. The response for the experiments conducted was die surface cleanliness. The presence and levels of contaminations would be analyzed and characterized using Scanning Electron Microscope (SEM), Fourier Transform Infrared Spectroscopy (FTIR) and Ion chromatography (IC). The optimization process required the integration between mechanical and chemical parameters. Chemical cleaning parameters optimization was aided with Micro Phase Cleaning (MPC) as solvent. Wash temperature and solvent concentration were varied to find the optimal cleaning. Whilst for mechanical parameters, washing pressure, and nozzle orientation are the expected parameters that would give impact to the cleaning process. From the experiments, the cleaning process is optimized with 3% of MPC solvent added into the pure DI water with longer wash exposure time 0.3 m/mm at 10 Psi with 75°C. The optimization result is proven with thermal cycle testing where no delammation or voids are detected even after 2500x.
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