纳米mosfet中表观迁移率降低的蒙特卡罗研究

K. Huet, J. Saint-Martin, A. Bournel, S. Galdin-Retailleau, P. Dollfus, G. Ghibaudo, M. Mouis
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引用次数: 33

摘要

迁移率的概念源于对固定输运的分析,其中载流子速度受到散射现象的限制,直到今天在微电子学中被广泛用作可测量的优点因素和用于预测器件性能的分析模型的参数。如果散射在十纳米级MOSFET中仍然起着重要的作用,并且不能被忽视,那么随着MOSFET的栅极长度趋于纳米级,沟道中的弹道输运变得越来越重要。在这种情况下,流动性概念可能显得非常值得怀疑。
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Monte Carlo study of apparent mobility reduction in nano-MOSFETs
The concept of mobility, resulting from an analysis of stationary transport where carrier velocity is limited by scattering phenomena, has been widely used till today in microelectronics as a measurable factor of merit and as a parameter of analytical models developed to predict device performance. If scatterings are still playing a major role in decananometer MOSFET and cannot be neglected, ballistic transport in the channel takes a growing importance as the gate length of MOSFETs tends to the nanometer scale. In this context, the mobility concept may appear as highly questionable.
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