{"title":"基于甲基硅氧烷的多孔低钾薄膜的x射线孔隙度表征","authors":"H. Lee, C. Soles, D. Liu, B. Bauer, E. Lin, W. Wu","doi":"10.1109/IITC.2003.1219725","DOIUrl":null,"url":null,"abstract":"Methylsilsesquioxane based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry to determine their pore size distribution, average density, wall density and porosity. By varying the porogen content from 1 % to 30 %, the porosity and the average pore size changed from 12 % to 34 % and from 10 /spl Aring/ to 15 /spl Aring/ in radius, respectively. The wall density was found to be independent of the porogen content and it appeared that the porogen is not 100% effective in generating pores. Pore size of these samples was also obtained from small angle neutron scattering measurements and the results were found to be consistent with that from XRP.","PeriodicalId":212619,"journal":{"name":"Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Structural characterization of methylsilsesquioxane-based porous low-k thin films using X-ray porosimetry\",\"authors\":\"H. Lee, C. Soles, D. Liu, B. Bauer, E. Lin, W. Wu\",\"doi\":\"10.1109/IITC.2003.1219725\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Methylsilsesquioxane based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry to determine their pore size distribution, average density, wall density and porosity. By varying the porogen content from 1 % to 30 %, the porosity and the average pore size changed from 12 % to 34 % and from 10 /spl Aring/ to 15 /spl Aring/ in radius, respectively. The wall density was found to be independent of the porogen content and it appeared that the porogen is not 100% effective in generating pores. Pore size of these samples was also obtained from small angle neutron scattering measurements and the results were found to be consistent with that from XRP.\",\"PeriodicalId\":212619,\"journal\":{\"name\":\"Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695)\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC.2003.1219725\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2003.1219725","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Structural characterization of methylsilsesquioxane-based porous low-k thin films using X-ray porosimetry
Methylsilsesquioxane based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry to determine their pore size distribution, average density, wall density and porosity. By varying the porogen content from 1 % to 30 %, the porosity and the average pore size changed from 12 % to 34 % and from 10 /spl Aring/ to 15 /spl Aring/ in radius, respectively. The wall density was found to be independent of the porogen content and it appeared that the porogen is not 100% effective in generating pores. Pore size of these samples was also obtained from small angle neutron scattering measurements and the results were found to be consistent with that from XRP.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
