{"title":"先进照相系统气泡弹簧头/薄膜界面的有限元分析","authors":"Donald J. Haugh, A. Brewen","doi":"10.1115/imece1996-1063","DOIUrl":null,"url":null,"abstract":"This paper describes the finite element model used to predict the spacing and contact pressure in an Advanced Photo System head/film interface. The particular interface analyzed was developed for use in photofinishing applications and is commonly referred to as a bubble spring interface, named after the flexure-like thin metal strip used to push the film against the magnetic head. The model results are validated by comparing predictions to measurements of the spring load-deflection profile and interferometrically measured head-to-film spacing contours. In addition, the model’s capability is demonstrated by using it to assess performance sensitivity to variations in spring load, head/film penetration, and film curl.","PeriodicalId":231650,"journal":{"name":"7th International Symposium on Information Storage and Processing Systems","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Finite Element Analysis of the Advanced Photo System Bubble Spring Head/Film Interface\",\"authors\":\"Donald J. Haugh, A. Brewen\",\"doi\":\"10.1115/imece1996-1063\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes the finite element model used to predict the spacing and contact pressure in an Advanced Photo System head/film interface. The particular interface analyzed was developed for use in photofinishing applications and is commonly referred to as a bubble spring interface, named after the flexure-like thin metal strip used to push the film against the magnetic head. The model results are validated by comparing predictions to measurements of the spring load-deflection profile and interferometrically measured head-to-film spacing contours. In addition, the model’s capability is demonstrated by using it to assess performance sensitivity to variations in spring load, head/film penetration, and film curl.\",\"PeriodicalId\":231650,\"journal\":{\"name\":\"7th International Symposium on Information Storage and Processing Systems\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-11-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"7th International Symposium on Information Storage and Processing Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1115/imece1996-1063\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"7th International Symposium on Information Storage and Processing Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1115/imece1996-1063","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Finite Element Analysis of the Advanced Photo System Bubble Spring Head/Film Interface
This paper describes the finite element model used to predict the spacing and contact pressure in an Advanced Photo System head/film interface. The particular interface analyzed was developed for use in photofinishing applications and is commonly referred to as a bubble spring interface, named after the flexure-like thin metal strip used to push the film against the magnetic head. The model results are validated by comparing predictions to measurements of the spring load-deflection profile and interferometrically measured head-to-film spacing contours. In addition, the model’s capability is demonstrated by using it to assess performance sensitivity to variations in spring load, head/film penetration, and film curl.