S. Ahn, G. Koh, K. Kwon, S. Baik, G. Jung, Y. Hwang, H. Jeong, Kinam Kim
{"title":"高度可扩展和cmos兼容的STTM单元技术","authors":"S. Ahn, G. Koh, K. Kwon, S. Baik, G. Jung, Y. Hwang, H. Jeong, Kinam Kim","doi":"10.1109/IEDM.2003.1269275","DOIUrl":null,"url":null,"abstract":"The technological challenges associated with STTM (scalable two transistor memory) cells were reviewed. First of all, the basic operating principles of the memory cell are discussed. This is followed by the introduction of the memory array formation and co-process of the I/O transistor, applying a 0.24 /spl mu/m design rule test vehicle. A new cell structure of a surrounded gate STTM structure is introduced. In addition, the process technology and the performance of the memory cell are presented.","PeriodicalId":344286,"journal":{"name":"IEEE International Electron Devices Meeting 2003","volume":"70 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Highly scalable and CMOS-compatible STTM cell technology\",\"authors\":\"S. Ahn, G. Koh, K. Kwon, S. Baik, G. Jung, Y. Hwang, H. Jeong, Kinam Kim\",\"doi\":\"10.1109/IEDM.2003.1269275\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The technological challenges associated with STTM (scalable two transistor memory) cells were reviewed. First of all, the basic operating principles of the memory cell are discussed. This is followed by the introduction of the memory array formation and co-process of the I/O transistor, applying a 0.24 /spl mu/m design rule test vehicle. A new cell structure of a surrounded gate STTM structure is introduced. In addition, the process technology and the performance of the memory cell are presented.\",\"PeriodicalId\":344286,\"journal\":{\"name\":\"IEEE International Electron Devices Meeting 2003\",\"volume\":\"70 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-12-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE International Electron Devices Meeting 2003\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2003.1269275\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Electron Devices Meeting 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2003.1269275","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Highly scalable and CMOS-compatible STTM cell technology
The technological challenges associated with STTM (scalable two transistor memory) cells were reviewed. First of all, the basic operating principles of the memory cell are discussed. This is followed by the introduction of the memory array formation and co-process of the I/O transistor, applying a 0.24 /spl mu/m design rule test vehicle. A new cell structure of a surrounded gate STTM structure is introduced. In addition, the process technology and the performance of the memory cell are presented.