Wenshen Li, Zongyang Hu, K. Nomoto, R. Jinno, Zexuan Zhang, Thieu Quang Tu, K. Sasaki, A. Kuramata, D. Jena, H. Xing
{"title":"2.44 kV Ga2O3垂直沟槽肖特基势垒二极管,具有极低的反漏电流","authors":"Wenshen Li, Zongyang Hu, K. Nomoto, R. Jinno, Zexuan Zhang, Thieu Quang Tu, K. Sasaki, A. Kuramata, D. Jena, H. Xing","doi":"10.1109/IEDM.2018.8614693","DOIUrl":null,"url":null,"abstract":"High-performance <tex>$\\beta$</tex>-Ga203 vertical trench Schottky barrier diodes (SBDs) are demonstrated on bulk Ga<inf>2</inf>O<inf>3</inf> substrates with a halide vapor phase epitaxial layer. A breakdown voltage (BV) of 2.44 kV, Baliga's figure-of-merit (BV<sup>2</sup>/R<inf>on</inf>) of 0.39 GW/cm<sup>2</sup> from DC measurements and 0.45 GW/cm<sup>2</sup> from pulsed measurements are achieved, all of which are the highest among <tex>$\\beta$</tex>-Ga<inf>2</inf>O<inf>3</inf>-based power devices. A lowest reverse leakage current density below <tex>$1\\ \\mu \\mathrm{A}/\\text{cm}^{2}$</tex> until breakdown is observed on devices with a fin width of <tex>$1-2\\ \\mu \\mathrm{m}$</tex>, thanks to the reduced surface field (RESURF) effect provided by the trench SBD structure. The specific on-resistance is found to reduce with increasing area ratio of the fin-channels following a simple relationship. The reverse leakage current agrees well with simulated results considering the barrier tunneling and barrier height lowering effects. The breakdown of the devices is identified to happen at the trench bottom corner, where a maximum electric field over 5 MV/cm could be sustained. This work marks a significant step toward reaching the promise of a high figure-of-merit in <tex>$\\beta$</tex>-Ga<inf>2</inf>O<inf>3</inf>.","PeriodicalId":152963,"journal":{"name":"2018 IEEE International Electron Devices Meeting (IEDM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"59","resultStr":"{\"title\":\"2.44 kV Ga2O3 vertical trench Schottky barrier diodes with very low reverse leakage current\",\"authors\":\"Wenshen Li, Zongyang Hu, K. Nomoto, R. Jinno, Zexuan Zhang, Thieu Quang Tu, K. Sasaki, A. Kuramata, D. Jena, H. Xing\",\"doi\":\"10.1109/IEDM.2018.8614693\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"High-performance <tex>$\\\\beta$</tex>-Ga203 vertical trench Schottky barrier diodes (SBDs) are demonstrated on bulk Ga<inf>2</inf>O<inf>3</inf> substrates with a halide vapor phase epitaxial layer. A breakdown voltage (BV) of 2.44 kV, Baliga's figure-of-merit (BV<sup>2</sup>/R<inf>on</inf>) of 0.39 GW/cm<sup>2</sup> from DC measurements and 0.45 GW/cm<sup>2</sup> from pulsed measurements are achieved, all of which are the highest among <tex>$\\\\beta$</tex>-Ga<inf>2</inf>O<inf>3</inf>-based power devices. A lowest reverse leakage current density below <tex>$1\\\\ \\\\mu \\\\mathrm{A}/\\\\text{cm}^{2}$</tex> until breakdown is observed on devices with a fin width of <tex>$1-2\\\\ \\\\mu \\\\mathrm{m}$</tex>, thanks to the reduced surface field (RESURF) effect provided by the trench SBD structure. The specific on-resistance is found to reduce with increasing area ratio of the fin-channels following a simple relationship. The reverse leakage current agrees well with simulated results considering the barrier tunneling and barrier height lowering effects. The breakdown of the devices is identified to happen at the trench bottom corner, where a maximum electric field over 5 MV/cm could be sustained. This work marks a significant step toward reaching the promise of a high figure-of-merit in <tex>$\\\\beta$</tex>-Ga<inf>2</inf>O<inf>3</inf>.\",\"PeriodicalId\":152963,\"journal\":{\"name\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"59\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2018.8614693\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2018.8614693","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
2.44 kV Ga2O3 vertical trench Schottky barrier diodes with very low reverse leakage current
High-performance $\beta$-Ga203 vertical trench Schottky barrier diodes (SBDs) are demonstrated on bulk Ga2O3 substrates with a halide vapor phase epitaxial layer. A breakdown voltage (BV) of 2.44 kV, Baliga's figure-of-merit (BV2/Ron) of 0.39 GW/cm2 from DC measurements and 0.45 GW/cm2 from pulsed measurements are achieved, all of which are the highest among $\beta$-Ga2O3-based power devices. A lowest reverse leakage current density below $1\ \mu \mathrm{A}/\text{cm}^{2}$ until breakdown is observed on devices with a fin width of $1-2\ \mu \mathrm{m}$, thanks to the reduced surface field (RESURF) effect provided by the trench SBD structure. The specific on-resistance is found to reduce with increasing area ratio of the fin-channels following a simple relationship. The reverse leakage current agrees well with simulated results considering the barrier tunneling and barrier height lowering effects. The breakdown of the devices is identified to happen at the trench bottom corner, where a maximum electric field over 5 MV/cm could be sustained. This work marks a significant step toward reaching the promise of a high figure-of-merit in $\beta$-Ga2O3.