紫外扫描监测SOI缺陷

2005 IEEE International SOI Conference Proceedings Pub Date : 2005-12-27 DOI:10.1109/SOI.2005.1563569

C. Moulin, D. Delprat, C. Maleville, W. Mcmillan, J. Payne, K. Bird well, R. Brun, R. Moirin

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摘要

本文展示了新一代的检测系统如何使我们能够按照ITRS路线图的要求监测SOI;它还显示了我们可以收集的大量关键信息，为我们提供了关于SOI过程的重要反馈。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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UV scanning for SOI defectivity monitoring

This paper shows how a new generation of inspection system enables us to monitor SOI as requested in the ITRS roadmaps; it shows also the large amount of key information we can collect, giving us important feedback on the SOI process.

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2005 IEEE International SOI Conference Proceedings

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