New self-aligned micromachining process for large free-space optical cross-connects

An improved self-aligned micromachining process for large-scale free-space optical cross-connect is presented. It satisfies the high accuracy optical alignment required for such application. This self-aligned batch process allows the simultaneous fabrication of vertical mirrors and fiber guides. It is performed in one level of mask lithography and combines deep RIE and KOH silicon etching.