高压和超高压碳化硅器件技术进展

Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura
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引用次数: 3

摘要

介绍了不同电压范围碳化硅器件技术的最新进展。这些发展特别对应于下一代高至超高压器件,SiC超结金属氧化物半导体场效应晶体管,SiC绝缘栅双极晶体管以及基本的双极退化抑制技术。我们期望这些下一代设备将引发电力电子领域的范式转变。
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Progress in High and Ultrahigh Voltage Silicon Carbide Device Technology
The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.
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