Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura
{"title":"高压和超高压碳化硅器件技术进展","authors":"Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura","doi":"10.1109/IEDM.2018.8614600","DOIUrl":null,"url":null,"abstract":"The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.","PeriodicalId":152963,"journal":{"name":"2018 IEEE International Electron Devices Meeting (IEDM)","volume":"150 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Progress in High and Ultrahigh Voltage Silicon Carbide Device Technology\",\"authors\":\"Y. Yonezawa, K. Nakayama, R. Kosugi, S. Harada, K. Koseki, K. Sakamoto, T. Kimoto, H. Okumura\",\"doi\":\"10.1109/IEDM.2018.8614600\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.\",\"PeriodicalId\":152963,\"journal\":{\"name\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"150 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2018.8614600\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2018.8614600","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Progress in High and Ultrahigh Voltage Silicon Carbide Device Technology
The current developments in silicon carbide (SiC) device technology in various voltage ranges are introduced. These developments correspond to, in particular, next-generation high to ultrahigh-voltage devices, SiC super-junction metal oxide semiconductor field effect transistors, SiC insulated gate bipolar transistors, and the fundamental bipolar degradation suppression technology. We expect that these next generation devices will trigger a paradigm shift in power electronics.