通道热载流子对PMOS亚微米晶体管可靠性的影响

I. Kitagawa, R. Baumann, I. Takigasaki, K. Maeda, Y. Ohashi, Y. Kikuchi, S. Murata
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引用次数: 0

摘要

PMOS晶体管中的通道热载流子(CHC)效应增加了驱动电流,降低了阈值电压(Vt)。虽然这些变化提高了器件的开关速度,但减小的Vt使晶体管更难“关断”。本工作的重点是定义CMOS亚微米工艺中PMOS晶体管的穿孔电压(BVDSS)作为栅极长度和应力电压的函数。提出了基于chc诱导的BVDSS退化的PMOS器件寿命模型和预测方法。
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Channel hot carrier impact on the reliability performance of PMOS submicron transistors
Channel hot carrier (CHC) effects in PMOS transistors increase the drive current and reduce the threshold voltage (Vt). While these changes improve the device switching speed, the decreased Vt renders the transistor harder to "turn off". This work focused on defining the punch through voltage (BVDSS) of PMOS transistors from a CMOS submicron process as a function of gate length and stress voltage. A model and predictions of PMOS device lifetimes based on the CHC-induced BVDSS degradation is presented.
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