在快速循环瞬态应力作用下,AIGaN/GaN Epi堆栈的时间依赖性早期击穿和hemt SOA边界的位移

B. Shankar, Ankit Soni, Sayak Dutta Gupta, S. Shikha, Sandeep Singh, S. Raghavan, M. Shrivastava
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引用次数: 4

摘要

本实验研究报告了第一次观察到(i) GaN HEMT中的SOA边界位移和(ii)垂直AIGaN/GaN Epi堆栈在快速变化(上升时间低于10ns)循环瞬态应力条件下的早期失效时间,用于600V合格的商业级HEMT堆栈。结果表明,在直流应力作用下具有10年寿命的叠层在循环瞬态应力作用下失效更快。包括拉曼/PL映射和CL光谱在内的综合电气和机械应力表征程序揭示了材料在瞬态应力条件下有限的独特失效物理。在瞬态和直流应力条件下,采用透射电镜对其进行了破坏分析,揭示了不同的退化特征和破坏机制。提出了循环瞬态应力作用下的失效模型。
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Time Dependent Early breakdown of AIGaN/GaN Epi Stacks and Shift in SOA Boundary of HEMTs Under Fast Cyclic Transient Stress
This experimental study reports first observations of (i) SOA boundary shift in GaN HEMTs and (ii) early time to fail of vertical AIGaN/GaN Epi stack under fast changing (sub-10ns risetime) cyclic transient stress conditions for a 600V qualified commercial grade HEMT stack. It is shown that a stack qualified for 10 years lifetime under DC stress, fails faster under cyclic transient stress. Integrated electrical and mechanical stress characterization routine involving Raman/PL mapping and CL spectroscopy reveals material limited unique failure physics under transient stress condition. Failure analysis using cross-sectional TEM investigations reveal signature of different degradation and failure mechanism under transient and DC stress conditions. A failure model is proposed for failure under cyclic transient stress.
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