T. Tomie, T. Aota, Y. Kurashima, N. Kandaka, H. Yashiro, K. Nishigori, I. Matsushima, M. Komuro
{"title":"用于EUV光刻的无碎片高转换效率腔限等离子体光源的研究","authors":"T. Tomie, T. Aota, Y. Kurashima, N. Kandaka, H. Yashiro, K. Nishigori, I. Matsushima, M. Komuro","doi":"10.1109/IMNC.2000.872765","DOIUrl":null,"url":null,"abstract":"We are proposing a cavity-confined type laser-produced plasma as a debris-less and high conversion efficiency source for EUV lithography. Our idea is devised in order to make the best use of solid target having higher conversion efficiency and easier wavelength tunability than gas targets. In order to overcome the debris problem, two contrivances are made, i.e., ablation of the solid surface by the irradiation of an ultrashort pulse, and enhancement of the ablated mass density by the cavity structure of the target. Preliminary experimental evaluation of the cavity confinement effect and high efficiency EUV emission are reported.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"118 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Study of a cavity-confined plasma as a debris-less and high conversion efficiency source for EUV lithography\",\"authors\":\"T. Tomie, T. Aota, Y. Kurashima, N. Kandaka, H. Yashiro, K. Nishigori, I. Matsushima, M. Komuro\",\"doi\":\"10.1109/IMNC.2000.872765\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We are proposing a cavity-confined type laser-produced plasma as a debris-less and high conversion efficiency source for EUV lithography. Our idea is devised in order to make the best use of solid target having higher conversion efficiency and easier wavelength tunability than gas targets. In order to overcome the debris problem, two contrivances are made, i.e., ablation of the solid surface by the irradiation of an ultrashort pulse, and enhancement of the ablated mass density by the cavity structure of the target. Preliminary experimental evaluation of the cavity confinement effect and high efficiency EUV emission are reported.\",\"PeriodicalId\":270640,\"journal\":{\"name\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"volume\":\"118 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.2000.872765\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872765","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Study of a cavity-confined plasma as a debris-less and high conversion efficiency source for EUV lithography
We are proposing a cavity-confined type laser-produced plasma as a debris-less and high conversion efficiency source for EUV lithography. Our idea is devised in order to make the best use of solid target having higher conversion efficiency and easier wavelength tunability than gas targets. In order to overcome the debris problem, two contrivances are made, i.e., ablation of the solid surface by the irradiation of an ultrashort pulse, and enhancement of the ablated mass density by the cavity structure of the target. Preliminary experimental evaluation of the cavity confinement effect and high efficiency EUV emission are reported.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
