K. Soejima, A. Shida, M. Hirata, H. Koga, J. Ukai, H. Sata
{"title":"用于模拟/数字asic的具有660 MHz垂直PNP晶体管的BiCMOS技术","authors":"K. Soejima, A. Shida, M. Hirata, H. Koga, J. Ukai, H. Sata","doi":"10.1109/CICC.1989.56785","DOIUrl":null,"url":null,"abstract":"A BiCMOS technology with a triple-diffused vertical p-n-p transistor has been developed to meet wide-bandwidth requirements for mixed analog/digital application-specific integrated circuits (ASICs). An fT of 660 MHz and BVceo of over 15 V were obtained for the p-n-p transistor, by adding only one extra mask to a conventional 2.0-μm BiCMOS process (a total of 20 masks for double-layer metallization). A unity-gain frequency of 52 MHz and DC gain of over 85 dB were obtained for a single-supply operational amplifier with p-n-p first stage. A propagation delay time of 1.27 ns for a CMOS 2 NAND gate has been obtained under a 3 F/O and 3-mm-length wiring load condition","PeriodicalId":165054,"journal":{"name":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"A BiCMOS technology with 660 MHz vertical PNP transistors for analog/digital ASICs\",\"authors\":\"K. Soejima, A. Shida, M. Hirata, H. Koga, J. Ukai, H. Sata\",\"doi\":\"10.1109/CICC.1989.56785\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A BiCMOS technology with a triple-diffused vertical p-n-p transistor has been developed to meet wide-bandwidth requirements for mixed analog/digital application-specific integrated circuits (ASICs). An fT of 660 MHz and BVceo of over 15 V were obtained for the p-n-p transistor, by adding only one extra mask to a conventional 2.0-μm BiCMOS process (a total of 20 masks for double-layer metallization). A unity-gain frequency of 52 MHz and DC gain of over 85 dB were obtained for a single-supply operational amplifier with p-n-p first stage. A propagation delay time of 1.27 ns for a CMOS 2 NAND gate has been obtained under a 3 F/O and 3-mm-length wiring load condition\",\"PeriodicalId\":165054,\"journal\":{\"name\":\"1989 Proceedings of the IEEE Custom Integrated Circuits Conference\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-05-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1989 Proceedings of the IEEE Custom Integrated Circuits Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CICC.1989.56785\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1989 Proceedings of the IEEE Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1989.56785","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A BiCMOS technology with 660 MHz vertical PNP transistors for analog/digital ASICs
A BiCMOS technology with a triple-diffused vertical p-n-p transistor has been developed to meet wide-bandwidth requirements for mixed analog/digital application-specific integrated circuits (ASICs). An fT of 660 MHz and BVceo of over 15 V were obtained for the p-n-p transistor, by adding only one extra mask to a conventional 2.0-μm BiCMOS process (a total of 20 masks for double-layer metallization). A unity-gain frequency of 52 MHz and DC gain of over 85 dB were obtained for a single-supply operational amplifier with p-n-p first stage. A propagation delay time of 1.27 ns for a CMOS 2 NAND gate has been obtained under a 3 F/O and 3-mm-length wiring load condition