半导体制造中基于动态控制策略的缺陷检测跳过算法

G. Rodríguez-Verján, S. Dauzére-Pérés, Sylvain Housseman, J. Pinaton
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引用次数: 12

摘要

在本文中,我们提出了一种新的方法来有效地管理半导体制造中使用动态采样策略时的缺陷检测队列。目的是确定可以跳过检验操作的批次,即对工艺工具风险水平影响有限的批次。本文所考虑的风险,称为风险晶圆(W@R),是在两个缺陷检查操作之间,在一个工艺工具上加工的晶圆数量。一个指标(GSI,全局抽样指标)用于评估整体W@R,另一个相关指标(LSI,批量调度指标)用于确定如果不测量批量对整体风险的影响。基于这些指标,提出了五种新的算法,并通过工业实例进行了验证。结果显示了我们的方法的相关性,并且评估跳跃的批次集比单独评估批次表现更好。
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Skipping algorithms for defect inspection using a dynamic control strategy in semiconductor manufacturing
In this paper, we propose new ways for efficiently managing defect inspection queues in semiconductor manufacturing when a dynamic sampling strategy is used. The objective is to identify lots that can skip the inspection operation, i.e. lots that have limited impact on the risk level of process tools. The risk considered in this paper, called Wafer at Risk (W@R), is the number of wafers processed on a process tool between two defect inspection operations. An indicator (GSI, Global Sampling Indicator) is used to evaluate the overall W@R and another associated indicator (LSI, Lot Scheduling Indicator) is used to identify the impact on the overall risk if a lot is not measured. Based on these indicators, five new algorithms are proposed and tested with industrial instances. Results show the relevance of our approach and that evaluating sets of lots for skipping performs better than evaluating lots individually.
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