SLCFET技术:带高性能放大器的单片集成低损耗开关的进展与未来方向

R. Howell
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引用次数: 1

摘要

下一代RF系统要求RF组件能够在越来越宽的多个倍频频带中保持其性能,支持操作灵活性和适应性,这是这些架构中基于直接信号转换的数字后端的主要特征。超晶格Castellated场效应晶体管(SLCFET)使用堆叠的AlGaN/GaN异质结,这些异质结被蚀刻成源极和漏极之间的平行纳米带,结合三维栅极结构,通过纳米带的侧壁同时处理堆叠异质结构中每个单独的2DEG层中的电荷,从而控制所产生的晶体管。由于SLCFET拓扑结构具有将晶体管的ON电阻与其OFF电容解耦的固有能力,因此SLCFET的器件结构被专门设计为解决fet中射频开关性能限制的解决方案,这种限制抑制了基于宽带射频开关的电路性能[1]。自该技术首次出现在出版物中[2]以来,该工艺已经成熟并得到了扩展,已经展示了6通道和10通道异质结构晶体管和射频开关mmic[3],并且6通道射频开关工艺已经得到了认证和产品化,如图1[4]。SLCFET技术作为高功率开关和低损耗、高线性度、快速开关技术的灵活性和广泛能力随后通过这种生产RF开关工艺得到了证明。通过低损耗、高隔离的0.1-4 GHz 100W SPDT开关[5],展示了SLCFET的高功率处理和开关能力,而通过展示0.4-2 GHz可重构带通滤波器[6],突出了SLCFET的快速开关、高线性能力。100W SPDT设计的隔离度提高了10倍,损耗降低了10%,而使用商业传统器件工艺构建的相同频率和功率水平的GaN SPDT所需的MMIC尺寸要小37%,如图2所示。可重构滤波器提供超过500个不同的滤波器通道,具有可变带宽和中心频率,如图3所示,所有这些都集成到一个集成电路中,在NF和插入损耗方面,每个滤波器通道平均提高2db,同时与使用最先进的GaAs pHEMT工艺构建的相同滤波器相比,功率处理能力提高约40倍,线性度提高约20倍。
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SLCFET Technology: Current Progress and Future Directions for Monolithically Integrated Low Loss Switches with High Performance Amplifiers
Next generation RF systems require RF components capable of maintaining their performance across increasingly wide, multiple octave frequency bandwidths, supporting the operational flexibility and adaptability that is a primary feature of the direct signal conversion based digital back-ends of these architectures. The Superlattice Castellated Feld Effect Transistor (SLCFET) uses stacked AlGaN/GaN heterojunctions that have been etched into parallel nanoribbons between source and drain, in combination with a three dimensional gate structure providing control of the resulting transistor by simultaneously addressing the charge in each individual 2DEG layer of the stacked heterostructures through the sidewalls of the nanoribbons. The device structure of the SLCFET was specifically engineered as a solution to the limits of RF switch performance in FETs that inhibits wideband RF switch based circuit performance, due to the SLCFET topology’s inherent capability of decoupling the transistor’s ON resistance from its OFF capacitance [1] . Since this technology’s first appearance in publication [2] , the process has matured and been extended, with both 6-channel and 10 channel heterostructure based transistors and RF switch MMICs demonstrated [3] , and the 6-channel RF switch process having been qualified and productized, Fig. 1 [4] . The flexibility and broad capabilities of the SLCFET technology as both a high power switch and a low loss, high linearity, fast switching technology have subsequently been demonstrated using this production RF switch process. The high power handling and switching capability of the SLCFET was demonstrated, with a low loss and high isolation 0.1–4 GHz 100W SPDT switch [5] , while the fast switching, high linearity capabilities of the SLCFET were highlighted by the demonstration of a 0.4–2 GHz reconfigurable bandpass filter [6] . The 100W SPDT design demonstrated 10x greater isolation along with ~10% improvement in loss while requiring a ~37% smaller MMIC size than a GaN SPDT designed for the same frequency and power level built using a commercial conventional device process, Fig. 2 . The reconfigurable filter provides over 500 different filter channels, with variable bandwidth and center frequencies, Fig. 3 , all integrated into a single integrated circuit, providing an average of 2 dB improvement for each filter channel in NF and insertion loss, along with ~40x more power handling and ~20x greater linearity than an identical filter built using a state-of-the-art GaAs pHEMT process.
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