高纯磷化铟老化效应的表征

B. Lee, D. K. Sengupta, W. R. Miller, S. A. Stockman, I. Szafranek, M. J. Mccollum, G. Stillman
{"title":"高纯磷化铟老化效应的表征","authors":"B. Lee, D. K. Sengupta, W. R. Miller, S. A. Stockman, I. Szafranek, M. J. Mccollum, G. Stillman","doi":"10.1109/ICIPRM.1990.203000","DOIUrl":null,"url":null,"abstract":"Changes in the characteristics of high-purity n-type InP samples with time have been studied using variable-temperature Hall effect measurements, photoluminescence, and photothermal ionization spectroscopy. The results indicate that the aging effect is a bulk effect and that it results from a major reduction in N/sub D/. The aging effect can be reversed by a short anneal at a temperature above 170 degrees C. The spectroscopy results show that the change in N/sub D/ is due entirely to a change in the Si shallow donor concentration. However, the mechanism of reduction of the shallow Si donor concentration with aging remains unknown. It seems probable that a limited concentration of unknown defect centers is involved and that the Si donors combine with these unknown defect centers to form inactive centers or to change the Si donor binding energy from shallow to deep level.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"72 1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Characterization of an aging effect in high purity indium phosphide\",\"authors\":\"B. Lee, D. K. Sengupta, W. R. Miller, S. A. Stockman, I. Szafranek, M. J. Mccollum, G. Stillman\",\"doi\":\"10.1109/ICIPRM.1990.203000\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Changes in the characteristics of high-purity n-type InP samples with time have been studied using variable-temperature Hall effect measurements, photoluminescence, and photothermal ionization spectroscopy. The results indicate that the aging effect is a bulk effect and that it results from a major reduction in N/sub D/. The aging effect can be reversed by a short anneal at a temperature above 170 degrees C. The spectroscopy results show that the change in N/sub D/ is due entirely to a change in the Si shallow donor concentration. However, the mechanism of reduction of the shallow Si donor concentration with aging remains unknown. It seems probable that a limited concentration of unknown defect centers is involved and that the Si donors combine with these unknown defect centers to form inactive centers or to change the Si donor binding energy from shallow to deep level.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"72 1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203000\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203000","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

利用变温霍尔效应测量、光致发光和光热电离光谱研究了高纯度n型InP样品的特性随时间的变化。结果表明,时效效应是一种体效应,是由N/sub / D大幅度降低引起的。在170℃以上的温度下进行短时间退火可以逆转时效效应。光谱结果表明,N/sub / D/的变化完全是由于Si浅层供体浓度的变化。然而,随着年龄的增长,浅层硅供体浓度降低的机制尚不清楚。似乎可能涉及到有限的未知缺陷中心的浓度,并且Si给体与这些未知缺陷中心结合形成非活性中心或将Si给体结合能从浅层变为深层。
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Characterization of an aging effect in high purity indium phosphide
Changes in the characteristics of high-purity n-type InP samples with time have been studied using variable-temperature Hall effect measurements, photoluminescence, and photothermal ionization spectroscopy. The results indicate that the aging effect is a bulk effect and that it results from a major reduction in N/sub D/. The aging effect can be reversed by a short anneal at a temperature above 170 degrees C. The spectroscopy results show that the change in N/sub D/ is due entirely to a change in the Si shallow donor concentration. However, the mechanism of reduction of the shallow Si donor concentration with aging remains unknown. It seems probable that a limited concentration of unknown defect centers is involved and that the Si donors combine with these unknown defect centers to form inactive centers or to change the Si donor binding energy from shallow to deep level.<>
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