{"title":"超薄二氧化硅中界面陷阱与栅极漏电流的关系","authors":"W. Loh, B. Cho","doi":"10.1109/IPFA.2002.1025672","DOIUrl":null,"url":null,"abstract":"In ultra-thin (20 /spl Aring/) gate oxide, it is observed that gate leakage current increases in discrete steps similar to quasi-breakdown in thicker oxide. A direct correlation is observed between this gate leakage and interface traps when stressed under both positive and negative gate polarity. Using different sample area, it is observed that this gate leakage current is highly localized but has a weak area dependency.","PeriodicalId":328714,"journal":{"name":"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Correlation between interface traps and gate leakage current in ultrathin silicon dioxides\",\"authors\":\"W. Loh, B. Cho\",\"doi\":\"10.1109/IPFA.2002.1025672\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In ultra-thin (20 /spl Aring/) gate oxide, it is observed that gate leakage current increases in discrete steps similar to quasi-breakdown in thicker oxide. A direct correlation is observed between this gate leakage and interface traps when stressed under both positive and negative gate polarity. Using different sample area, it is observed that this gate leakage current is highly localized but has a weak area dependency.\",\"PeriodicalId\":328714,\"journal\":{\"name\":\"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-11-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA.2002.1025672\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2002.1025672","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Correlation between interface traps and gate leakage current in ultrathin silicon dioxides
In ultra-thin (20 /spl Aring/) gate oxide, it is observed that gate leakage current increases in discrete steps similar to quasi-breakdown in thicker oxide. A direct correlation is observed between this gate leakage and interface traps when stressed under both positive and negative gate polarity. Using different sample area, it is observed that this gate leakage current is highly localized but has a weak area dependency.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
