{"title":"基于45nm SOI CMOS的28ghz, 18dbm, 48% PAE的耦合电感中和堆叠fet功率放大器","authors":"Kang Ning, J. Buckwalter","doi":"10.1109/BCICTS.2018.8550832","DOIUrl":null,"url":null,"abstract":"A single stage, millimeter-wave 2-stack FET power amplifier operates with a peak saturated power of 18.2 dBm and peak PAE of 48.2%. The high PAE results from a proposed $C_{gd}$ neutralization through coupled inductor feedback between the drains of the stacked FETs. The technique reuses the interstage matching shunt inductor to reduce the loss and chip area while improving the PA gain. The PA achieves 13.6 dB gain with a 3 dB bandwidth of 12 GHz at a 2.4-V power supply. The PA is implemented in a 4S-nm SOI CMOS technology using a trap-rich substrate and has an area of $\\mathbf{520}\\ \\mu\\mathbf{m}\\times \\mathbf{530}\\ \\mu\\mathbf{m}$. To the author's knowledge, this work demonstrates the highest gain and power added efficiency (PAE) for a single-stage Si-based PA at 28 GHz.","PeriodicalId":272808,"journal":{"name":"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"A 28-GHz, 18-dBm, 48% PAE Stacked-FET Power Amplifier with Coupled-Inductor Neutralization in 45-nm SOI CMOS\",\"authors\":\"Kang Ning, J. Buckwalter\",\"doi\":\"10.1109/BCICTS.2018.8550832\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A single stage, millimeter-wave 2-stack FET power amplifier operates with a peak saturated power of 18.2 dBm and peak PAE of 48.2%. The high PAE results from a proposed $C_{gd}$ neutralization through coupled inductor feedback between the drains of the stacked FETs. The technique reuses the interstage matching shunt inductor to reduce the loss and chip area while improving the PA gain. The PA achieves 13.6 dB gain with a 3 dB bandwidth of 12 GHz at a 2.4-V power supply. The PA is implemented in a 4S-nm SOI CMOS technology using a trap-rich substrate and has an area of $\\\\mathbf{520}\\\\ \\\\mu\\\\mathbf{m}\\\\times \\\\mathbf{530}\\\\ \\\\mu\\\\mathbf{m}$. To the author's knowledge, this work demonstrates the highest gain and power added efficiency (PAE) for a single-stage Si-based PA at 28 GHz.\",\"PeriodicalId\":272808,\"journal\":{\"name\":\"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"volume\":\"47 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/BCICTS.2018.8550832\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCICTS.2018.8550832","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
摘要
单级毫米波2堆叠FET功率放大器的峰值饱和功率为18.2 dBm,峰值PAE为48.2%。高PAE是通过在堆叠场效应管漏极之间的耦合电感反馈来中和的。该技术采用级间匹配分流电感,在提高增益的同时减小损耗和芯片面积。该放大器在2.4 v电源下实现13.6 dB增益,3db带宽为12 GHz。该PA采用富含陷阱的基板,采用4snm SOI CMOS技术实现,面积为$\mathbf{520}\ \mu\mathbf{m}乘以\mathbf{530}\ \mu\mathbf{m}$。据作者所知,这项工作展示了28ghz单级si基PA的最高增益和功率附加效率(PAE)。
A 28-GHz, 18-dBm, 48% PAE Stacked-FET Power Amplifier with Coupled-Inductor Neutralization in 45-nm SOI CMOS
A single stage, millimeter-wave 2-stack FET power amplifier operates with a peak saturated power of 18.2 dBm and peak PAE of 48.2%. The high PAE results from a proposed $C_{gd}$ neutralization through coupled inductor feedback between the drains of the stacked FETs. The technique reuses the interstage matching shunt inductor to reduce the loss and chip area while improving the PA gain. The PA achieves 13.6 dB gain with a 3 dB bandwidth of 12 GHz at a 2.4-V power supply. The PA is implemented in a 4S-nm SOI CMOS technology using a trap-rich substrate and has an area of $\mathbf{520}\ \mu\mathbf{m}\times \mathbf{530}\ \mu\mathbf{m}$. To the author's knowledge, this work demonstrates the highest gain and power added efficiency (PAE) for a single-stage Si-based PA at 28 GHz.