在工业FDSOI的BEOL中使用门保护二极管的高性能集成ph传感器

G. Ayele, S. Monfray, S. Ecoffey, F. Boeuf, J. Cloarec, D. Drouin, A. Souifi
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引用次数: 1

摘要

这是在BEOL中使用标准FDSOI晶体管的栅极保护二极管的CMOS ph传感器的首次演示。利用DIBL效应引起极陡的漏极电流开关,可用于制造极灵敏的ph传感器。漏极电流发生突然切换时的后门电压取决于栅极保护二极管处的电位。将pH传感膜集成在二极管BEOL金属上,位移取决于产生比例电位的液体的pH值。漏极电流的突然切换(小至9 mV/ 10年)可以提供每单位pH值6.6 10年漏极电流变化的理论最大灵敏度。在本文中,我们报告了1.25 10年/pH的实验灵敏度,优于最先进的CMOS pH传感器,其最大灵敏度为0.9 10年/pH。
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Highly Performant Integrated pH-Sensor Using the Gate Protection Diode in the BEOL of Industrial FDSOI
This is the first demonstration of a CMOS pH-sensor using the gate protection diode of standard FDSOI transistors in the BEOL. The extremely steep switching of the drain current induced by an exploitation of the DIBL effect is used for fabrication of extremely sensitive pH-sensors. The back gate voltage at which the abrupt switching of drain current occurs depends on the potential at the gate protection diode. Integrating the pH sensing film on this diode BEOL metal, the shift depends on the pH value of the liquid which creates a proportional potential. The abrupt switching (as small as 9 mV/decade) of the drain current can give a theoretical maximum sensitivity of 6.6 decade of drain current change per unit pH. In this paper, we report an experimental sensitivity of 1.25 decade/pH which is superior to state-of-the-art CMOS pH sensors which have a maximum sensitivity of 0.9 decade/pH.
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