小几何双极晶体管的高频特性

P. van Wijnen, L. Smith
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引用次数: 9

摘要

提出了对小型双极晶体管进行频率高达18 GHz的“晶圆上”小信号高频测量。通过精确的校准和校正技术,获得了电流增益、跨导和最大功率增益特性作为频率和直流偏置条件的函数。讨论了与这些特性有关的优值f/下标t/f/下标y/和f/下标max/,并给出了有关时间常数的简化分析。基于改进的Gummel/Poon模型的仿真结果表明,通过考虑基极电阻和基极传输时间的电流依赖性以及多余相移的建模,可以获得良好的高频建模效果。最后强调了分布式基极-集电极电容建模的重要性,该建模是在Gummel/Poon模型中完成的,参数为x/sub cjc/。即使对于远低于截止频率的频率,这也是非常重要的
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High frequency characterization of small geometry bipolar transistors
Small-signal high-frequency measurements of small bipolar transistors, carried out 'on wafer' up to a frequency of 18 GHz, are presented. Current gain, transconductance, and maximum power gain characteristics as a function of frequency and DC bias conditions have been obtained with accurate calibration and correction techniques. The figures of merit, f/sub t/f/sub y/, and f/sub max/, associated with these characteristics have been discussed, and a simplified analysis of the relevant time constants has been given. Simulation results with a modified Gummel/Poon model show that good high-frequency modeling can be achieved by taking into account the current dependence of the base resistance and the base transit time, and the modeling of excess phase shift. Finally the importance of modeling the distributed base-collector capacitance, which is accomplished in the Gummel/Poon model with the parameter x/sub cjc/, has been emphasized. It is very important even for frequencies well below the cutoff frequency.<>
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The best-case power-delay products for polysilicon-contacted bipolar-transistor gates. A theoretical study The effect of emitter sidewall isolation on the emitter junction in a double layer polysilicon bipolar process Delay analysis for BiCMOS drivers Comparing techniques for fabrication polysilicon contacted emitter bipolar transistors Thin base formation by double diffused polysilicon technology
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