电沉积和合金化条件下低温键合的纳米孔结构控制

M. Saito, K. Matsunaga, J. Mizuno, H. Nishikawa
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摘要

我们研究了一种低温键形成过程,其中电极表面通过电沉积和合金化形成纳米孔结构。采用电化学沉积和电化学方法研究了纳米孔Au-Ag结构的形貌控制。退火后,经合金化处理的电沉积Au-Ag薄膜的韧带尺寸增大。在150°C退火后,膜的韧带尺寸从10-20 nm增加到50-100 nm。经50°C退火后的样品显示出更细的纳米孔结构,这与评估样品的最高结合强度相对应。尽管阳极电流是所检查薄膜中最大的,但在沉积样品上选择性溶解的体积很小。电感耦合等离子体质谱(ICP-MS)分析表明,沉积样品经脱合金处理后,膜中银含量的变化最小。韧带尺寸小,纳米孔结构细,结合强度高。
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Nano-porous structure control under electrodeposition and dealloying conditions for low-temperature bonding
We investigated a low-temperature bond formation process, wherein nanoporous structures were formed on electrode surfaces by electrodeposition and dealloying. The morphology control of a nanoporous Au-Ag structure was investigated using electrochemical deposition and electrochemical methods. The ligament size of the electrodeposited Au-Ag films after dealloying increased upon annealing. The ligament size of 10-20 nm for as-deposited increased to 50-100 nm for films annealed at 150 °C. The samples that were annealed at 50 °C before dealloying indicated a finer nanoporous structure, which corresponded to the highest bond strength of the evaluated samples. The volume of selective dissolution was small on as-deposited samples despite the anodic current being the largest of the examined films. Inductively coupled plasma mass spectrometry (ICP-MS) analysis showed that the change of the Ag content of the films after dealloying of as-deposited samples was the smallest of the examined films. Small ligament size with a finer nanoporous structure resulted in high bond strength.
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