Shuhei Tokuyama, Hiroaki Kato, T. Kachi, K. Miyashita, Kenya Kobayashi
{"title":"用于中压应用的高性能双场极板沟槽mosfet","authors":"Shuhei Tokuyama, Hiroaki Kato, T. Kachi, K. Miyashita, Kenya Kobayashi","doi":"10.1109/ISPSD57135.2023.10147550","DOIUrl":null,"url":null,"abstract":"We propose a 200 V-class dual-field-plate (DFP) trench MOSFET (DFP MOSFET), which has multiple field-plate of different length inside the deep trench. This structure can be formed by simple DFP process. To clarify optimum design of DFP structure and reveal its potential, we verify the significant device parameters by TCAD simulation. We obtained a specific on-resistance of $147.7\\ \\ \\mathrm{m}\\Omega\\cdot \\text{mm}^{2}$ at a breakdown voltage of 237 V, which is the best result in comparable voltage rating MOSFETs.","PeriodicalId":344266,"journal":{"name":"2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"44 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High Performance Dual Field Plate Trench MOSFETs for Middle-voltage Applications\",\"authors\":\"Shuhei Tokuyama, Hiroaki Kato, T. Kachi, K. Miyashita, Kenya Kobayashi\",\"doi\":\"10.1109/ISPSD57135.2023.10147550\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose a 200 V-class dual-field-plate (DFP) trench MOSFET (DFP MOSFET), which has multiple field-plate of different length inside the deep trench. This structure can be formed by simple DFP process. To clarify optimum design of DFP structure and reveal its potential, we verify the significant device parameters by TCAD simulation. We obtained a specific on-resistance of $147.7\\\\ \\\\ \\\\mathrm{m}\\\\Omega\\\\cdot \\\\text{mm}^{2}$ at a breakdown voltage of 237 V, which is the best result in comparable voltage rating MOSFETs.\",\"PeriodicalId\":344266,\"journal\":{\"name\":\"2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"volume\":\"44 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-05-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD57135.2023.10147550\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD57135.2023.10147550","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High Performance Dual Field Plate Trench MOSFETs for Middle-voltage Applications
We propose a 200 V-class dual-field-plate (DFP) trench MOSFET (DFP MOSFET), which has multiple field-plate of different length inside the deep trench. This structure can be formed by simple DFP process. To clarify optimum design of DFP structure and reveal its potential, we verify the significant device parameters by TCAD simulation. We obtained a specific on-resistance of $147.7\ \ \mathrm{m}\Omega\cdot \text{mm}^{2}$ at a breakdown voltage of 237 V, which is the best result in comparable voltage rating MOSFETs.