多功率集成电路中CDM故障的芯片级仿真

Jea-Chun Lee, Y. Huh, Jau-Wen Chen, P. Bendix, S. Kang
{"title":"多功率集成电路中CDM故障的芯片级仿真","authors":"Jea-Chun Lee, Y. Huh, Jau-Wen Chen, P. Bendix, S. Kang","doi":"10.1109/EOSESD.2000.890116","DOIUrl":null,"url":null,"abstract":"This paper presents a new chip-level simulation methodology for charged-device model (CDM) failure analysis in multi-power ICs. A circuit model considering reported CDM failures and efficient simulation is proposed and incorporated with the circuit-level ESD simulator, iETSIM. The CDM behaviors in multi-power ICs are analyzed and the vulnerable sites to CDM stress can be predicted by chip-level simulation. Simulation results are verified by CDM testing of a 0.25 /spl mu/m CMOS ASIC and show good correlation. This simulation methodology at the full-chip level enables us to address CDM failure issues before the detailed chip floorplan and power grid networking are started.","PeriodicalId":332394,"journal":{"name":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":"{\"title\":\"Chip-level simulation for CDM failures in multi-power ICs\",\"authors\":\"Jea-Chun Lee, Y. Huh, Jau-Wen Chen, P. Bendix, S. Kang\",\"doi\":\"10.1109/EOSESD.2000.890116\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a new chip-level simulation methodology for charged-device model (CDM) failure analysis in multi-power ICs. A circuit model considering reported CDM failures and efficient simulation is proposed and incorporated with the circuit-level ESD simulator, iETSIM. The CDM behaviors in multi-power ICs are analyzed and the vulnerable sites to CDM stress can be predicted by chip-level simulation. Simulation results are verified by CDM testing of a 0.25 /spl mu/m CMOS ASIC and show good correlation. This simulation methodology at the full-chip level enables us to address CDM failure issues before the detailed chip floorplan and power grid networking are started.\",\"PeriodicalId\":332394,\"journal\":{\"name\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"25\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EOSESD.2000.890116\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EOSESD.2000.890116","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 25

摘要

本文提出了一种用于多功率集成电路中充电器件模型(CDM)失效分析的芯片级仿真方法。提出了一种考虑CDM失效和有效仿真的电路模型,并将其与电路级ESD模拟器iETSIM相结合。分析了多功率集成电路中的CDM行为,并通过芯片级仿真预测了CDM应力的易损点。仿真结果通过0.25 /spl μ m CMOS ASIC的CDM测试得到验证,具有良好的相关性。这种全芯片级的仿真方法使我们能够在详细的芯片平面图和电网网络开始之前解决CDM故障问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Chip-level simulation for CDM failures in multi-power ICs
This paper presents a new chip-level simulation methodology for charged-device model (CDM) failure analysis in multi-power ICs. A circuit model considering reported CDM failures and efficient simulation is proposed and incorporated with the circuit-level ESD simulator, iETSIM. The CDM behaviors in multi-power ICs are analyzed and the vulnerable sites to CDM stress can be predicted by chip-level simulation. Simulation results are verified by CDM testing of a 0.25 /spl mu/m CMOS ASIC and show good correlation. This simulation methodology at the full-chip level enables us to address CDM failure issues before the detailed chip floorplan and power grid networking are started.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
ESD damage thresholds: history and prognosis [magnetic heads] Electrostatic discharge characterization of epitaxial-base silicon-germanium heterojunction bipolar transistors A study of static-dissipative tweezers for handling giant magneto-resistive recording heads A study of the mechanisms for ESD damage to reticles Floating gate EEPROM as EOS indicators during wafer-level GMR processing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1