用于成品率管理的SRAM模块探测中电子束信号的区分

Gregory M. Johnson, Baohua Niu, T. Lundquist, A. Rummel, M. Kemmler
{"title":"用于成品率管理的SRAM模块探测中电子束信号的区分","authors":"Gregory M. Johnson, Baohua Niu, T. Lundquist, A. Rummel, M. Kemmler","doi":"10.1109/ASMC.2019.8791824","DOIUrl":null,"url":null,"abstract":"Probing is increasingly utilized as a technique for the characterization of the local electrical properties of an integrated circuit, as well as the isolation of defects. Test structures and/or SRAM arrays were examined with the various probing modes available with a probing system. Test structures were examined using Electron Beam Absorbed Current (EBAC), Resistive Contrast Imaging (RCI), Electron Beam Induced Current, (EBIC), and EBIRCH (Electron Beam Induced Resistance CHange). The results demonstrate the utility of using each in an SRAM yield management scenario. EBAC is able to provide information about basic connectivity. RCI allows for the isolation of resistive spots along a conductor. EBIC provides for the imaging of depletion zones between PW and NW, even in a planar view. EBIRCH, being driven by two different mechanisms (thermal coefficient of resistivity and Seebeck effect) is able to provide two different kinds of analyses, depending on the conditions. EBIRCH precisely isolated which of a few fins in a multi-fin device are responsible for a short and showed the thermal relations between the elements of a pulldown device in an SRAM. The techniques together provide multiple forms of process feedback when used as part of an integrated yield management program involving analysis of via chains, SRAM parallel array test structures, and SRAMs.","PeriodicalId":287541,"journal":{"name":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"219 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Distinguishing between electron-beam signals in probing of SRAM modules for yield management\",\"authors\":\"Gregory M. Johnson, Baohua Niu, T. Lundquist, A. Rummel, M. Kemmler\",\"doi\":\"10.1109/ASMC.2019.8791824\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Probing is increasingly utilized as a technique for the characterization of the local electrical properties of an integrated circuit, as well as the isolation of defects. Test structures and/or SRAM arrays were examined with the various probing modes available with a probing system. Test structures were examined using Electron Beam Absorbed Current (EBAC), Resistive Contrast Imaging (RCI), Electron Beam Induced Current, (EBIC), and EBIRCH (Electron Beam Induced Resistance CHange). The results demonstrate the utility of using each in an SRAM yield management scenario. EBAC is able to provide information about basic connectivity. RCI allows for the isolation of resistive spots along a conductor. EBIC provides for the imaging of depletion zones between PW and NW, even in a planar view. EBIRCH, being driven by two different mechanisms (thermal coefficient of resistivity and Seebeck effect) is able to provide two different kinds of analyses, depending on the conditions. EBIRCH precisely isolated which of a few fins in a multi-fin device are responsible for a short and showed the thermal relations between the elements of a pulldown device in an SRAM. The techniques together provide multiple forms of process feedback when used as part of an integrated yield management program involving analysis of via chains, SRAM parallel array test structures, and SRAMs.\",\"PeriodicalId\":287541,\"journal\":{\"name\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"219 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2019.8791824\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2019.8791824","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

探测越来越多地被用作表征集成电路的局部电学特性以及隔离缺陷的技术。测试结构和/或SRAM阵列用探测系统提供的各种探测模式进行了检测。采用电子束吸收电流(EBAC)、电阻对比成像(RCI)、电子束感应电流(EBIC)和电子束感应电阻变化(EBIRCH)检测测试结构。结果证明了在SRAM产量管理场景中使用每种方法的实用性。EBAC能够提供有关基本连接的信息。RCI允许沿导体隔离电阻点。EBIC提供了PW和NW之间枯竭带的成像,即使在平面视图中也是如此。EBIRCH由两种不同的机制(电阻率热系数和塞贝克效应)驱动,能够根据不同的条件提供两种不同的分析。EBIRCH精确地分离了多翅片器件中哪几个翅片负责短路,并显示了SRAM中下拉器件元件之间的热关系。当作为集成收率管理程序的一部分使用时,这些技术一起提供多种形式的过程反馈,包括通孔链、SRAM并行阵列测试结构和SRAM的分析。
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Distinguishing between electron-beam signals in probing of SRAM modules for yield management
Probing is increasingly utilized as a technique for the characterization of the local electrical properties of an integrated circuit, as well as the isolation of defects. Test structures and/or SRAM arrays were examined with the various probing modes available with a probing system. Test structures were examined using Electron Beam Absorbed Current (EBAC), Resistive Contrast Imaging (RCI), Electron Beam Induced Current, (EBIC), and EBIRCH (Electron Beam Induced Resistance CHange). The results demonstrate the utility of using each in an SRAM yield management scenario. EBAC is able to provide information about basic connectivity. RCI allows for the isolation of resistive spots along a conductor. EBIC provides for the imaging of depletion zones between PW and NW, even in a planar view. EBIRCH, being driven by two different mechanisms (thermal coefficient of resistivity and Seebeck effect) is able to provide two different kinds of analyses, depending on the conditions. EBIRCH precisely isolated which of a few fins in a multi-fin device are responsible for a short and showed the thermal relations between the elements of a pulldown device in an SRAM. The techniques together provide multiple forms of process feedback when used as part of an integrated yield management program involving analysis of via chains, SRAM parallel array test structures, and SRAMs.
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