采用高性能不流动底填膏改进倒装芯片贴附工艺

C. Hatano, H. Takahashi, T. Ichida
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引用次数: 2

摘要

可控折叠芯片连接(C4)和金对金互连(GGI)是倒装芯片互连的典型工艺。在这些工艺中,在IC芯片上形成的焊料球或金疙瘩和中间衬底上的电路通过冶金方法相互连接。然后用底填材料封装金属-金属连接。这些倒装芯片表面安装工艺提供了出色的接触可靠性。然而,在下填充过程中需要两个独立的步骤,如“封装”和“固化”。因此,需要相对较长的加工时间和较低的性价比。相反,“一步压贴工艺”是一种简单的表面贴装工艺,具有很高的性价比。“一步工艺”利用连接材料的热收缩,不需要冶金连接。用于这些工艺的典型材料是ACF(各向异性导电膜)、ACP(各向异性导电浆料)、NCP(非导电浆料)和NCF(非导电膜)。不幸的是,这一过程的可靠性尚未完全确定。由于不存在冶金连接,一步法的可靠性取决于材料收缩产生的结合力。因此,一步工艺的可靠性被认为不如下填料封装(两步)工艺,特别是在严峻等级可靠性试验条件下。我们研究了这两种工艺,然后开发了用于片上芯片(COF)应用的“改进的一步压缩贴附工艺”。该工艺采用不流动底填料,实现了冶金连接。这意味着,金属-金属互连,封装和固化下填料是在一个步骤中进行的。这种“改进的一步压缩附加工艺”使用“ESPANEX”作为柔性印刷电路板(FPC)。“ESPANEX”是一种无粘合剂的覆铜层压板材料,具有良好的耐热性和尺寸稳定性。新等级的不流动底填材料“ESAREX”被开发用于该工艺。“ESAREX”在室温下具有高粘接强度和长罐寿命。将这两种材料结合在一起,一步完成了金与锡的互连、不流动底填料的封装和固化。在热循环、高压锅(PCT)和高温高湿(HHT)试验中,采用“改进的一步压缩贴附工艺”,取得了优异的可靠性结果。
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Modified flip-chip attach process using high performance non-flow underfill paste
Controlled collapse chip connection (C4) and Gold to gold interconnection (GGI) are the typical processes of the flip chip interconnection. In these processes, solder balls or gold bumps formed on the IC chip and the circuit on the interposer substrate are metallurgically connected with each other. Next the metal-metal connection is encapsulated with the underfill material. These flip chip surface mounting processes give excellent contact reliability. However, two separate steps are required at the underfilling process, such as "Encapsulation" and "Curing". Accordingly, it takes relatively longer process time and lower cost performance. On the contrary, "One-step compression attach process" is a simple surface mounting process with high cost performance. "One-step process" utilizes the thermal shrinkage of the connecting materials and no metallurgical connection is attained. Typical materials used for these processes are ACF (anisotropic conductive film), ACP (anisotropic conductive paste), NCP (non conductive paste) and NCF (non conductive film). Unfortunately, reliability of this process is not fully established yet. As no metallurgical connection exists, reliability of One-step process depends on binding force, generated by material's shrinkage. Therefore reliability of One-step process is considered to be inferior to the underfill encapsulation (Two-step) process, especially under the severe level reliability test condition. We investigated both processes and then developed "Modified one step compression attach process" for Chip On Film (COF) applications. This process achieved metallurgical connection, using non-flow underfill. This means, metal-metal interconnection, encapsulation and cure of the underfill are processed in a single step. This "Modified one step compression attach process" used "ESPANEX" as flexible printed circuit board (FPC). "ESPANEX" is adhesive-less Copper Clad Laminate material which has good heat resistance and dimensional stability. New grade of the non-flow underfill material, "ESAREX" is developed for this process. "ESAREX" has high adhesive strength and long pot life at room temperature. As combined of these two materials, interconnection between gold and tin, encapsulation and curing of non-flow underfill are processed in a single step. We achieved excellent reliability results in the thermal cycle, pressure cooker (PCT) and the high temperature and high humidity (HHT) tests, using "Modified one step compression attach process".
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