一种评估接触面积以提高接触电阻测量精度的方法

Proceedings of the 1991 International Conference on Microelectronic Test Structures Pub Date : 1990-03-18 DOI:10.1109/ICMTS.1990.161707

A. Walton, M. Fallon, J. Stevenson, A. Ross, R. Holwill

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引用次数: 2

摘要

接触面积是测量片材电阻率的一个重要参数。作者提出了可以用来表示接触面积的模型以及计算接触面积所需的测量值。特别注意的是光学测量，SEM(扫描电子显微镜)和游标式测量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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A methodology for evaluating the area of contacts to improve the accuracy of contact resistance measurements

The contact area is an important parameter in the measurement of specific sheet resistivity. The authors propose models which can be used to represent the area of contact together with the measurements that are required for the calculation of contact area. Particular attention is given to optical measurements, SEM (scanning electron microscope), and Vernier-type measurements.<>

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Proceedings of the 1991 International Conference on Microelectronic Test Structures

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