CVD和ALD前体的改进液源汽化

K. Erickson, Thuc M. Dinh, Eric Ellsworth, Hongxu Duan
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引用次数: 0

摘要

在最先进的微电子制造中使用的许多先进气相工艺对液体蒸汽输送解决方案提出了更高的要求。汽化挑战包括各种具有独特材料特性的液体,使用低蒸汽压的液体或使用热分解和汽化之间小窗口的液体。越来越多的短脉冲处理实现也需要更快的响应时间。性能增强型Turbo-VaporizerTM液体输送系统为液体汽化提供了一种新的选择。
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Improved Liquid Source Vaporization for CVD & ALD Precursors
Many of the advanced gas-phase processes used in state-of-the art microelectronic fabrication place higher demands on liquid vapor delivery solutions. Vaporization challenges include a diverse range of liquids with unique material properties, the use of liquids with low vapor pressure or the use of liquids with a small window between thermal decomposition and vaporization. The growing implementation of short pulse processing also creates a need for faster response times. The Performance Enhanced Turbo-VaporizerTM Liquid Delivery System presents a new alternative for liquid vaporization.
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