K. Erickson, Thuc M. Dinh, Eric Ellsworth, Hongxu Duan
{"title":"CVD和ALD前体的改进液源汽化","authors":"K. Erickson, Thuc M. Dinh, Eric Ellsworth, Hongxu Duan","doi":"10.1109/ASMC.2019.8791829","DOIUrl":null,"url":null,"abstract":"Many of the advanced gas-phase processes used in state-of-the art microelectronic fabrication place higher demands on liquid vapor delivery solutions. Vaporization challenges include a diverse range of liquids with unique material properties, the use of liquids with low vapor pressure or the use of liquids with a small window between thermal decomposition and vaporization. The growing implementation of short pulse processing also creates a need for faster response times. The Performance Enhanced Turbo-VaporizerTM Liquid Delivery System presents a new alternative for liquid vaporization.","PeriodicalId":287541,"journal":{"name":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improved Liquid Source Vaporization for CVD & ALD Precursors\",\"authors\":\"K. Erickson, Thuc M. Dinh, Eric Ellsworth, Hongxu Duan\",\"doi\":\"10.1109/ASMC.2019.8791829\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Many of the advanced gas-phase processes used in state-of-the art microelectronic fabrication place higher demands on liquid vapor delivery solutions. Vaporization challenges include a diverse range of liquids with unique material properties, the use of liquids with low vapor pressure or the use of liquids with a small window between thermal decomposition and vaporization. The growing implementation of short pulse processing also creates a need for faster response times. The Performance Enhanced Turbo-VaporizerTM Liquid Delivery System presents a new alternative for liquid vaporization.\",\"PeriodicalId\":287541,\"journal\":{\"name\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2019.8791829\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2019.8791829","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improved Liquid Source Vaporization for CVD & ALD Precursors
Many of the advanced gas-phase processes used in state-of-the art microelectronic fabrication place higher demands on liquid vapor delivery solutions. Vaporization challenges include a diverse range of liquids with unique material properties, the use of liquids with low vapor pressure or the use of liquids with a small window between thermal decomposition and vaporization. The growing implementation of short pulse processing also creates a need for faster response times. The Performance Enhanced Turbo-VaporizerTM Liquid Delivery System presents a new alternative for liquid vaporization.