Noble Approach to Remove Films Isotropically-Atomistically at Room Temperature by Introducing Rapid Thermal Pulse Sequentially

Atomistic-isotropic film removal has been demonstrated using noble techniques. Its surface modification such as oxidation or halogenation has been used to form a volatile by-product of mono layer by decoupled plasma. Surface modification has been developed using various conditions to adsorb with specific chemistries such as ligands or halogens at low water temperature, and in-situ thermal pulse with flash lamp as a desorption step has been performed to remove films atomistically to avoid unwanted thermal budget and extremely high selectivity. Finally performing continuous sequential cycle of adsorption and desorption step enables to remove films consistently with infinite selectivity.