高成品率光集成兼容inp基电路

T. Williams, H. Fuji, J. Harrang, R. Daniels, H. Griem, D. West, S. Ray, G. Larue
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引用次数: 2

摘要

提出了一套基于inp的InGaAs/InAlAs异质结构场效应管(hfet)数字电路。该技术被设计为与1.3 μ m光学探测器集成兼容。集成级别从42到91个设备不等。为了比较,我们制作了带和不带光学探测器外延层的晶圆。实现了高成品率的高速性能,表明可以提高集成度,实现更强大的光电电路功能。有光学层存在的环形振荡器门延迟在16 mW/门时低至61 ps,除以2工作到1.6 GHz。仿真结果表明,优化后的器件尺寸可以显著提高电路性能。四个晶圆的高良率表明复杂OEICs是可行的。
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High yield optical integration compatible InP-based circuits
A set of digital circuits made with InP-based InGaAs/InAlAs heterostructure FETs (HFETs) is presented. The technology was designed to be integration-compatible with 1.3- mu m optical detectors. Integration levels ranged from 42 to 91 devices. For comparison, wafers were made with and without the optical detector epitaxial layers. High-speed performance with high yield has been achieved, showing that integration levels can be increased to realize more powerful optoelectronic circuit functions. Ring oscillator gate delays, with optical layers present, were as low as 61 ps at 16 mW/gate, and divide-by-2 operated to 1.6 GHz. Simulations show that optimized device sizing should significantly improve circuit performance. The high yield across four wafers indicates that complex OEICs are feasible.<>
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Expertise, optimisation and control of InP and related technologies by scanning photoluminescence measurements Dislocation density after S-diffusion into p-type InP substrates Surface recombination and high efficiency in InP solar cells Molecular beam epitaxial growth techniques for graded-composition InGaAlAs/InP alloys Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
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