砷化镓衬底上InSb薄膜的MBE生长和电学性能

Y. Zhang, P. P. Chen, T. Lin, H. Xia, T. X. Li
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引用次数: 4

摘要

采用分子束外延(MBE)技术在GaAs(001)衬底上生长了一系列不同厚度的InSb薄膜。采用高分辨率x射线衍射(HRXRD)、原子力显微镜(AFM)和霍尔测量对InSb薄膜进行了表征。测试结果表明,薄膜具有良好的晶体质量和电学性能。结果表明,随着薄膜厚度的减小,晶体质量和电学性能下降。并对InSb薄膜的室温磁阻进行了测试和详细讨论。
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MBE growth and electrical properties of InSb film on GaAs substrate
A series of InSb films with different thickness were grown by molecular beam epitaxy (MBE) on GaAs (001) substrates. The InSb films were characterized by the high-resolution x-ray diffraction (HRXRD), atomic force microscope (AFM) and Hall measurement. The measurements revealed that the films have good crystal quality and electrical properties. It was found that the crystal quality and the electrical properties degenerate with decrease of film thickness. And the room temperature magnetoresistance of the InSb films was also measured and discussed in detail.
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