{"title":"在执行SPC时调整过程:一种基于实验顺序设计的方法","authors":"E. Sachs, Á. Ingólfsson, S. Ha","doi":"10.1109/ASMC.1990.111236","DOIUrl":null,"url":null,"abstract":"An approach to process control called generalized SPC which allows for the diagnosis of a process while the process is being tuned is discussed. A control module, the run by run controller, that implements a form of adaptive control based on the sequential design of experiments is discussed. Statistical process control is compared to the run by run controller.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Tuning a process while performing SPC: an approach based on the sequential design of experiments\",\"authors\":\"E. Sachs, Á. Ingólfsson, S. Ha\",\"doi\":\"10.1109/ASMC.1990.111236\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An approach to process control called generalized SPC which allows for the diagnosis of a process while the process is being tuned is discussed. A control module, the run by run controller, that implements a form of adaptive control based on the sequential design of experiments is discussed. Statistical process control is compared to the run by run controller.<<ETX>>\",\"PeriodicalId\":158760,\"journal\":{\"name\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-09-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1990.111236\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111236","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Tuning a process while performing SPC: an approach based on the sequential design of experiments
An approach to process control called generalized SPC which allows for the diagnosis of a process while the process is being tuned is discussed. A control module, the run by run controller, that implements a form of adaptive control based on the sequential design of experiments is discussed. Statistical process control is compared to the run by run controller.<>