0.18和0.35微米技术的容错有源像素传感器

2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems Pub Date : 2006-10-04 DOI:10.1109/DFT.2006.31

M. L. Haye, C. Jung, David Chen, G. Chapman, J. Dudas

{"title":"0.18和0.35微米技术的容错有源像素传感器","authors":"M. L. Haye, C. Jung, David Chen, G. Chapman, J. Dudas","doi":"10.1109/DFT.2006.31","DOIUrl":null,"url":null,"abstract":"A fault tolerant active pixel sensor (FTAPS) has been designed and fabricated to correct for point defects that occur in CMOS image sensors both at manufacturing and over the lifetime of the sensor. For some time it has been known that fabrication of CMOS image sensors in processes less than 0.35mum would generate significant performance changes, yet imagers are being fabricated in 0.18mum technology or smaller. Therefore the characteristics of the FTAPS are presented for pixels fabricated in both a standard 0.18mum and 0.35mum CMOS process and compared for consistency","PeriodicalId":113870,"journal":{"name":"2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems","volume":"84 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Fault Tolerant Active Pixel Sensors in 0.18 and 0.35 Micron Technologies\",\"authors\":\"M. L. Haye, C. Jung, David Chen, G. Chapman, J. Dudas\",\"doi\":\"10.1109/DFT.2006.31\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A fault tolerant active pixel sensor (FTAPS) has been designed and fabricated to correct for point defects that occur in CMOS image sensors both at manufacturing and over the lifetime of the sensor. For some time it has been known that fabrication of CMOS image sensors in processes less than 0.35mum would generate significant performance changes, yet imagers are being fabricated in 0.18mum technology or smaller. Therefore the characteristics of the FTAPS are presented for pixels fabricated in both a standard 0.18mum and 0.35mum CMOS process and compared for consistency\",\"PeriodicalId\":113870,\"journal\":{\"name\":\"2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems\",\"volume\":\"84 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DFT.2006.31\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DFT.2006.31","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 6

摘要

设计和制造了一种容错有源像素传感器(FTAPS)，以纠正CMOS图像传感器在制造和使用寿命期间出现的点缺陷。一段时间以来，人们已经知道，在小于0.35 μ m的工艺中制造CMOS图像传感器将产生显着的性能变化，但成像仪正在以0.18 μ m或更小的工艺制造。因此，介绍了在标准0.18和0.35 μ m CMOS工艺中制造的像素的FTAPS特性，并比较了其一致性

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

Fault Tolerant Active Pixel Sensors in 0.18 and 0.35 Micron Technologies

A fault tolerant active pixel sensor (FTAPS) has been designed and fabricated to correct for point defects that occur in CMOS image sensors both at manufacturing and over the lifetime of the sensor. For some time it has been known that fabrication of CMOS image sensors in processes less than 0.35mum would generate significant performance changes, yet imagers are being fabricated in 0.18mum technology or smaller. Therefore the characteristics of the FTAPS are presented for pixels fabricated in both a standard 0.18mum and 0.35mum CMOS process and compared for consistency

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2006 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems

自引率

0.00%

发文量