多晶SiC中红外光学性能与沉积条件的关系

J. Provine, Christopher S. Roper, Jon A. Schuller, M. L. Brongersma, Roya Maboudian, R. T. Howe
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摘要

本文报道了用低压化学气相沉积法(LPCVD)沉积的多晶碳化硅(poly-SiC)薄膜光学性能的实验测量。EM光谱中红外区域的测量表明,远场传输和表面模式与沉积条件有很强的依赖性,包括掺杂水平、二氯硅烷(DCS)与1,3二丁烷(DSB)的比例以及对薄膜进行的退火。我们观察到近场声子极化子共振的相对强度、极化子间隙的出现和非凡光传输(EOT)的实现之间的联系。
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The dependence of poly-crystalline SiC mid-infrared optical properties on deposition conditions
We report on experimental measurements of the optical properties of thin films of poly-crystalline silicon carbide (poly-SiC) deposited by means of low pressure chemical vapor deposition (LPCVD). Measurements in the mid-IR region of the EM spectrum show strong dependence of both far field transmission and surface modes upon the deposition conditions including doping levels, ratio of dichlorosilane (DCS) to 1,3 disilabutane (DSB), and anneals performed on the film. We observe the link between the relative strength of near field phonon polariton resonances, the appearance of a polariton gap, and the achievement of extraordinary optical transmission (EOT).
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