基于二维泊松方程的薄膜SOI resuf结构解析物理模型

Wenhong Li, Jinsheng Luo
{"title":"基于二维泊松方程的薄膜SOI resuf结构解析物理模型","authors":"Wenhong Li, Jinsheng Luo","doi":"10.1109/ICSICT.1998.786077","DOIUrl":null,"url":null,"abstract":"In this paper, a novel analytical physical model for a thin film SOI RESURF structure is developed, based on the 2D Poisson equation, and the influence of the field SiO/sub 2/ interface charge is considered. The thin film SOI RESURF structure is analyzed using this novel model. There are two electric field peak values at the interfaces of the p/sup +/n and n/sup +/n junctions. The potential distribution is similar to a step between the p/sup +/n and n/sup +/n junctions. The field SiO/sub 2/ interface charge makes the electric field increase at the interface of the p/sup +/n junction, and reduces the electric field at the interface of the n/sup +/n junction. The analytical results agree with the simulations of MEDICI.","PeriodicalId":286980,"journal":{"name":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A novel analytical physical model for thin film SOI RESURF structure based on 2-D Poisson equation\",\"authors\":\"Wenhong Li, Jinsheng Luo\",\"doi\":\"10.1109/ICSICT.1998.786077\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a novel analytical physical model for a thin film SOI RESURF structure is developed, based on the 2D Poisson equation, and the influence of the field SiO/sub 2/ interface charge is considered. The thin film SOI RESURF structure is analyzed using this novel model. There are two electric field peak values at the interfaces of the p/sup +/n and n/sup +/n junctions. The potential distribution is similar to a step between the p/sup +/n and n/sup +/n junctions. The field SiO/sub 2/ interface charge makes the electric field increase at the interface of the p/sup +/n junction, and reduces the electric field at the interface of the n/sup +/n junction. The analytical results agree with the simulations of MEDICI.\",\"PeriodicalId\":286980,\"journal\":{\"name\":\"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)\",\"volume\":\"35 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-10-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSICT.1998.786077\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT.1998.786077","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

本文基于二维泊松方程,考虑了SiO/sub - 2/界面电荷的影响,建立了一种新型的薄膜SOI RESURF结构解析物理模型。利用该模型分析了SOI薄膜材料的结构。在p/sup +/n和n/sup +/n结点的界面处存在两个电场峰值。电位分布类似于p/sup +/n和n/sup +/n连接之间的步骤。SiO/sub 2/界面电荷使p/sup +/n界面处的电场增大,使n/sup +/n界面处的电场减小。分析结果与美第奇的模拟结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
A novel analytical physical model for thin film SOI RESURF structure based on 2-D Poisson equation
In this paper, a novel analytical physical model for a thin film SOI RESURF structure is developed, based on the 2D Poisson equation, and the influence of the field SiO/sub 2/ interface charge is considered. The thin film SOI RESURF structure is analyzed using this novel model. There are two electric field peak values at the interfaces of the p/sup +/n and n/sup +/n junctions. The potential distribution is similar to a step between the p/sup +/n and n/sup +/n junctions. The field SiO/sub 2/ interface charge makes the electric field increase at the interface of the p/sup +/n junction, and reduces the electric field at the interface of the n/sup +/n junction. The analytical results agree with the simulations of MEDICI.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Silicon nano-crystals based MOS memory and effects of traps on charge storage characteristics Nonlinear modeling of 4 W 12 mm multi-cell microwave power GaAs MESFET Thermally excited micromechanical vacuum resonator Electrochemical etching used on UHV/CVD epitaxial thin films The reduction of base resistance of SiGe/Si HBT via ion implantation and side-wall oxide self-aligned technique
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1