{"title":"InP的阳极溶解","authors":"M. Faur, M. Faur, M. Goradia, S. Bailey","doi":"10.1109/ICIPRM.1990.203025","DOIUrl":null,"url":null,"abstract":"An experimental study was conducted in order to select a suitable electrolytic solution and to optimize the anodic dissolution process of InP surface so as to be able to control the thinning of heavily doped surface layers of n/sup +/-p or p/sup +/-n InP structures. Several electrolytic solutions based on HCl, H/sub 3/PO/sub 4/, H/sub 2/SO/sub 4/, HF, CH/sub 3/COOH and H/sub 2/O/sub 2/ were investigated. From the analysis of electrochemical C-V, and I-V characteristics at different DC bias voltages and illumination levels and from scanning electron microscope inspection, it was determined that HF:CH/sub 3/COOH:H/sub 2/O/sub 2/:H/sub 2/O solution is a good candidate for rendering smooth surfaces, free of contamination and with good electrical characteristics, by anodic dissolution of n/sup +/- or p/sup +/-InP front surfaces.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"83 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Anodic dissolution of InP\",\"authors\":\"M. Faur, M. Faur, M. Goradia, S. Bailey\",\"doi\":\"10.1109/ICIPRM.1990.203025\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An experimental study was conducted in order to select a suitable electrolytic solution and to optimize the anodic dissolution process of InP surface so as to be able to control the thinning of heavily doped surface layers of n/sup +/-p or p/sup +/-n InP structures. Several electrolytic solutions based on HCl, H/sub 3/PO/sub 4/, H/sub 2/SO/sub 4/, HF, CH/sub 3/COOH and H/sub 2/O/sub 2/ were investigated. From the analysis of electrochemical C-V, and I-V characteristics at different DC bias voltages and illumination levels and from scanning electron microscope inspection, it was determined that HF:CH/sub 3/COOH:H/sub 2/O/sub 2/:H/sub 2/O solution is a good candidate for rendering smooth surfaces, free of contamination and with good electrical characteristics, by anodic dissolution of n/sup +/- or p/sup +/-InP front surfaces.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"83 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203025\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203025","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An experimental study was conducted in order to select a suitable electrolytic solution and to optimize the anodic dissolution process of InP surface so as to be able to control the thinning of heavily doped surface layers of n/sup +/-p or p/sup +/-n InP structures. Several electrolytic solutions based on HCl, H/sub 3/PO/sub 4/, H/sub 2/SO/sub 4/, HF, CH/sub 3/COOH and H/sub 2/O/sub 2/ were investigated. From the analysis of electrochemical C-V, and I-V characteristics at different DC bias voltages and illumination levels and from scanning electron microscope inspection, it was determined that HF:CH/sub 3/COOH:H/sub 2/O/sub 2/:H/sub 2/O solution is a good candidate for rendering smooth surfaces, free of contamination and with good electrical characteristics, by anodic dissolution of n/sup +/- or p/sup +/-InP front surfaces.<>
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