InAs/GaSb/InAs三量子阱的拓扑能带结构

M. Meyer, S. Schmid, F. Jabeen, G. Bastard, Fabian Hartmann, S. Höfling
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引用次数: 1

摘要

我们提出了基于InAs/GaSb/InAs三重量子阱(TQW)的拓扑绝缘子的栅极电压和温度相关输运测量。栅极电压相关的测量使我们能够监测与两个inas阱相关的非杂化电子区深处的两个电子密度。此外,由于杂化电子-空穴带结构,它们在价带(VB)中显示出明显的杂化隙和Van Hove奇点(VHS)。当费米能(EF)在空隙和价带底部Γ点时,电子和空穴密度共存,而在远的导带或价带中只能找到单一载流子类型。因此,我们能够识别该材料体系的拓扑带结构。此外,我们研究了杂化隙的温度演化,发现了一个对温度不敏感的杂化隙能量。
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Topological band structure in InAs/GaSb/InAs triple quantum wells
We present gate voltage and temperature dependent transport measurements of topological insulators based on InAs/GaSb/InAs triple quantum wells (TQW). Gate voltage dependent measurements enable us to monitor two electrons densities deep in the nonhybridized electron regime related to both InAs-wells. Furthermore, they reveal a clear hybridization gap and a Van Hove singularity (VHS) in the valence band (VB) because of the hybridized electron-hole band structure. Electron and hole densities coexist if the Fermi energy (EF) is within the gap and the bottom of the valence band at the Γ point whereas only single carrier types can be found far in the conduction or valence band. Thus, we are able to identify the topological band structure of this material system. Additionally, we study the temperature evolution of the hybridization gap and find a rather temperature insensitive hybridization gap energy.
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