{"title":"有效的蒙特卡罗设备仿真与自动误差控制","authors":"F.M. Bufler, A. Schenk, W. Fichtner","doi":"10.1109/SISPAD.2000.871198","DOIUrl":null,"url":null,"abstract":"A single-particle approach to Monte Carlo device simulation is presented where the simulation is stopped when the error for the drain, substrate or gate current is below a predefined error bar. This is achieved by alternating an ensemble simulation in the contact elements, used for the injection of a carrier, with a single-particle simulation in the active device area, thus enabling stochastically independent current estimates. Together with efficient Monte Carlo techniques, leading to CPU times of typically one hour per bias point, this makes full-band Monte Carlo \"affordable\" for the simulation of submicron MOSFETs.","PeriodicalId":132609,"journal":{"name":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","volume":"66 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Efficient Monte Carlo device simulation with automatic error control\",\"authors\":\"F.M. Bufler, A. Schenk, W. Fichtner\",\"doi\":\"10.1109/SISPAD.2000.871198\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A single-particle approach to Monte Carlo device simulation is presented where the simulation is stopped when the error for the drain, substrate or gate current is below a predefined error bar. This is achieved by alternating an ensemble simulation in the contact elements, used for the injection of a carrier, with a single-particle simulation in the active device area, thus enabling stochastically independent current estimates. Together with efficient Monte Carlo techniques, leading to CPU times of typically one hour per bias point, this makes full-band Monte Carlo \\\"affordable\\\" for the simulation of submicron MOSFETs.\",\"PeriodicalId\":132609,\"journal\":{\"name\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"volume\":\"66 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2000.871198\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2000.871198","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Efficient Monte Carlo device simulation with automatic error control
A single-particle approach to Monte Carlo device simulation is presented where the simulation is stopped when the error for the drain, substrate or gate current is below a predefined error bar. This is achieved by alternating an ensemble simulation in the contact elements, used for the injection of a carrier, with a single-particle simulation in the active device area, thus enabling stochastically independent current estimates. Together with efficient Monte Carlo techniques, leading to CPU times of typically one hour per bias point, this makes full-band Monte Carlo "affordable" for the simulation of submicron MOSFETs.