离子束改性高温超导体薄膜制备超导纳米器件

W. Lang, M. Marksteiner, M. Dineva, T. Enzenhofer, K. Siraj, M. Peruzzi, J. Pedarnig, D. Bauerle, R. Korntner, E. Cekan, E. Platzgummer, H. Loeschner
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引用次数: 0

摘要

离子束辐照可以直接改变高温超导体(HTS)的电性能。离子-靶相互作用的计算机模拟表明,能量在60kev以上的He+离子不会植入到100nm厚的yba2cu3o7薄膜中,但在技术上可行的离子剂量为1015cm-2时,每个单位电池可以产生大约一个缺陷。这些点缺陷主要是YBa2Cu3O7氧原子的位移。累积离子辐照后的x射线分析和电阻率测量证实,尽管超导体转化为绝缘体,但晶体结构的主要组成部分仍保持完整。超导纳米器件可以用这种方法制造,通过放置在离材料表面一定距离的掩膜,将低发散光离子束引导到高温超导薄膜上。在单步过程中,薄膜的照明区域从超导转变为半导体甚至绝缘。
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Ion-beam modification of high-temperature superconductor thin films for the fabrication of superconductive nanodevices
Ion-beam irradiation allows for a direct modification of the electric properties of high-temperature superconductors (HTS). Computer simulations of the ion-target interactions reveal that He+ions at energies above 60 keV do not implant into 100-nm thick films of YBa2Cu3O7but can create about one defect per unit cell at technically feasible ion doses of a few 1015cm-2. These point defects are primarily displacements of the oxygen atoms of YBa2Cu3O7. X-ray analysis and measurements of the electrical resistivity after cumulative ion irradiation confirm that the main building blocks of the crystal structure remain intact although the superconductor is converted to an insulator. Superconductive nanodevices can be fabricated with this method by directing a low-divergence beam of light ions at a thin film of HTS through a mask placed at a distance from the surface of the material. The illuminated areas of the film are converted from superconducting to semiconducting and even insulating in a single-step process.
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