{"title":"材料分析，概述","authors":"G. Riga","doi":"10.1109/IRPS.1980.362927","DOIUrl":null,"url":null,"abstract":"The problem of analyzing a material is considered in its generalities. The principal characteristic of a material, some of the analytical techniques used by the semiconductor industry, and the major factors affecting an analysis are briefly reviewed. Examples of the parameters that can be measured to characterize a metallic film, a semiconductor crystal, and a dielectric thin layer are reported.","PeriodicalId":270567,"journal":{"name":"18th International Reliability Physics Symposium","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1980-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Materials Analysis, An Overview\",\"authors\":\"G. Riga\",\"doi\":\"10.1109/IRPS.1980.362927\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The problem of analyzing a material is considered in its generalities. The principal characteristic of a material, some of the analytical techniques used by the semiconductor industry, and the major factors affecting an analysis are briefly reviewed. Examples of the parameters that can be measured to characterize a metallic film, a semiconductor crystal, and a dielectric thin layer are reported.\",\"PeriodicalId\":270567,\"journal\":{\"name\":\"18th International Reliability Physics Symposium\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1980-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"18th International Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.1980.362927\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"18th International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1980.362927","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The problem of analyzing a material is considered in its generalities. The principal characteristic of a material, some of the analytical techniques used by the semiconductor industry, and the major factors affecting an analysis are briefly reviewed. Examples of the parameters that can be measured to characterize a metallic film, a semiconductor crystal, and a dielectric thin layer are reported.
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