{"title":"先进自对准双极晶体管的周长效应","authors":"S. Sawada","doi":"10.1109/BIPOL.1988.51080","DOIUrl":null,"url":null,"abstract":"Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current.<<ETX>>","PeriodicalId":302949,"journal":{"name":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Perimeter effect in advanced self-aligned bipolar transistor\",\"authors\":\"S. Sawada\",\"doi\":\"10.1109/BIPOL.1988.51080\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current.<<ETX>>\",\"PeriodicalId\":302949,\"journal\":{\"name\":\"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,\",\"volume\":\"55 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-09-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/BIPOL.1988.51080\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1988.51080","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Perimeter effect in advanced self-aligned bipolar transistor
Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current.<>