高度可制造的1Gb SDRAM

Lee, Nam, Park, Kim, Moon, Choi
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引用次数: 16

摘要

采用0.18 pm CMOS技术制备了完全工作的1G SDRAM(1073741824位)。据我们所知,这是有史以来第一个完全工作的最高密度DRAM。通过实现1Gb SDRAM的完全工作,开启了千兆比特密度的时代。该1Gb SDRAM采用了逆行双阱、STI、TiSi2栅极、Ta205+HSG电容、深接触工艺、w插拔和w布线工艺以及宽松双金属化工艺。此外,CMP过程也用于全球和局部地形。在本研究中,将报告实现完全工作的1Gb SDRAM的关键项目。
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Highly Manufacturable 1Gb SDRAM
A fully working 1G SDRAM( 1073741824 bits) is fabricated by 0.18 pm CMOS technology. This is, to the best of our knowledge, the first fully working highest density DRAM ever achieved. By realizing fully working 1Gb SDRAM, the era of giga bit density is opened. The technologies employed in this 1Gb SDRAM are retrograded twin-well, STI, TiSi2 gate, Ta205+HSG capacitor, deep contact process, W-plug and W-wiring process followed by relaxed double metallization. In addition, the CMP process is also used for the global and local topography. In this study, the key items for realizing a fully working 1Gb SDRAM will be reported.
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