基于标准BCD工艺的电源管理芯片欠压闭锁电路优化设计

Shulin Liu, Qianqian Wang, Chaoying Wang, Zhi Huang
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引用次数: 2

摘要

提出了一种双极CMOS DMOS (BCD)工艺中欠压锁相电路的优化设计。与传统结构相比,该电路通过在带隙基准中引入高阶温度补偿函数,有效地降低了滞后电压随温度的漂移。从而提高了UVLO电路的可靠性。所设计的UVLO电路在T = 25C时的输入高阈值电压为8.2 V,低阈值电压为5.6 V,滞回范围为2.6 V。在−30 ~ 140C范围内最大偏差为0.3V。在标准的BCD过程中,使用Spectre在Cadence中对设计的电路进行了仿真。仿真结果验证了所设计UVLO电路的可行性和正确性。
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Optimization design of under voltage lockout circuit in power management chips based on standard BCD process
An optimization design of an Under Voltage Lockout (UVLO) circuit in a bipolar CMOS DMOS (BCD) process is presented in this paper. Compared with the traditional structure, the proposed circuit effectively reduces the hysteresis voltage drift with temperature by introducing the high-order temperature compensation function to the band-gap reference. Thus, the reliability of the UVLO circuit is improved. The designed UVLO circuit has an input high threshold voltage of 8.2 V, low threshold voltage of 5.6 V and a hysteresis range of 2.6 V when T = 25C. The maximum deviation is 0.3V within −30 ∼ 140C. In a standard BCD process, the designed circuit is simulated by using Spectre in Cadence. The feasibility and correctness of the designed UVLO circuit is proven by the simulation results.
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