商用射频前端模块应用的SiGe BiCMOS工艺

E. Preisler, K. Moen, J. Zheng, P. Hurwitz, S. Chaudhry, M. Racanelli
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引用次数: 0

摘要

在过去的十年中,SiGe BiCMOS工艺已成为商业无线电产品前端模块(FEM)的支柱。SiGe BiCMOS工艺在商品CMOS的低成本和基于III-V的技术的高性能之间提供了一个很好的折衷。这使他们能够以非常大批量产品可接受的成本水平解决蜂窝电话和其他复杂无线电系统中FEM组件的许多困难规格挑战。本文给出了SiGe BiCMOS工艺在功率放大器、低噪声放大器、射频开关及其组合等fem中的应用实例。此外,还讨论了SiGe BiCMOS在更高频率下解决新兴商业应用的效用。
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SiGe BiCMOS processes for commercial RF front-end-module applications
Over the past decade, SiGe BiCMOS processes have become a mainstay in the Front-End-Module (FEM) of commercial radio products. SiGe BiCMOS processes offer an excellent compromise between the low cost of commodity CMOS and the high performance of III-V based technologies. This allows them to address many of the difficult specification challenges of FEM components in cellular phones and other complex radio systems at a cost level that is acceptable for very high volume products. In this paper several examples of applications of SiGe BiCMOS processes in FEMs are given, including power amplifiers, low-noise amplifiers, RF switches and combinations thereof. Further, the utility of SiGe BiCMOS to address emerging commercial applications at higher frequencies is discussed.
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