多晶硅发射体-接触双极晶体管电流增益的优化及温度依赖性

C.L. Williams, D.M. Kim, C. Clawson
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引用次数: 3

摘要

本文对影响多晶硅发射体-接触双极晶体管电流增益的因素进行了实验和理论研究。具体来说,对增益的温度特性及其优化进行了全面的讨论。结果表明,与传统晶体管相比,PEC晶体管表现出更强的温度依赖性。这归因于多晶硅中少数载流子(空穴)的扩散长度。对增益(h/sub fe/)的建模表明,多晶硅中少数载流子的迁移率和复合寿命是优化PEC晶体管中h/sub fe/的关键参数。
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Optimization and temperature dependence of current gain in polysilicon-emitter-contacted bipolar transistors
Presented herein are the results of an experimental and theoretical investigation of the factors influencing the current gain of a polysilicon-emitter-contacted bipolar transistor (PEC transistor). Specifically, the temperature behavior of gain and its optimization are comprehensively discussed. The results show that the PEC transistor exhibits a stronger temperature dependence when compared with conventional transistors. This is attributed to the diffusion length of minority carriers (holes) in the polysilicon. The modeling of the gain (h/sub fe/) reveals that the mobility and the recombination lifetime of the minority carriers in the polysilicon are the key parameters for optimizing h/sub fe/ in PEC transistors.<>
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The best-case power-delay products for polysilicon-contacted bipolar-transistor gates. A theoretical study The effect of emitter sidewall isolation on the emitter junction in a double layer polysilicon bipolar process Delay analysis for BiCMOS drivers Comparing techniques for fabrication polysilicon contacted emitter bipolar transistors Thin base formation by double diffused polysilicon technology
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