LTG-GaAs中导电的表征

J. Bourgoin, K. Khirouni, J. Nagle
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引用次数: 1

摘要

研究了分子束外延生长在150 ~ 400℃范围内的砷化镓层的直流和交流电导率。发现导纳与频率的关系Y(/spl ω /)具有普遍的特性。在低频Y(/spl ω /)是恒定的,然后在/spl ω //sub m/处呈现最小值。在高频下,Y(/spl ω /)随/spl ω /线性变化,表明传导是通过跳频发生的。Y(0)的温度依赖性表明,这种跳变传导发生在与EL2缺陷相关的部分填充带中,/spl ω //sub m/与Y(0)之间的直接关系表明,存在一种渗透状态,即由绝缘区域限制的传导,我们将其归因于周围以沉淀形式发展的空间电荷区域。
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Characterization of conduction in LTG-GaAs
The d.c. and a.c. electrical conduction has been studied in GaAs layer grown by molecular beam epitaxy between 150/spl deg/C and 400/spl deg/C. It is found that the admittance versus frequency, Y(/spl omega/), exhibits a universal behaviour. At low frequencies Y(/spl omega/) is constant, then exhibits a minimum at /spl omega//sub m/. At high frequencies Y(/spl omega/) varies linearly as /spl omega/ showing that conduction occurs via hopping. The temperature dependence of Y(0) indicates that this hopping conduction occurs in a partially filled band related to EL2 defects, the direct relationship between /spl omega//sub m/ and Y(0) demonstrates the existence of a percolation regime, i.e. of a conduction limited by insulating regions which we attribute to space charge regions developed around as precipitates.
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