发射极宽度缩放对PA应用SiGe hbt性能和坚固性的影响

S. Sirohi, V. Jain, Ajay Raman, B. T. Nukala, Elanchezhian Veeramani, J. Adkisson, A. Joseph
{"title":"发射极宽度缩放对PA应用SiGe hbt性能和坚固性的影响","authors":"S. Sirohi, V. Jain, Ajay Raman, B. T. Nukala, Elanchezhian Veeramani, J. Adkisson, A. Joseph","doi":"10.1109/BCICTS.2018.8551054","DOIUrl":null,"url":null,"abstract":"We present performance and ruggedness trade-offs for the different emitter widths of SiGe HBTs using GLOBALFOUNDRIES 1K5PAXE technology for power amplifier (PA) applications. The technology offers HBTs with low intrinsic base resistance (RBI) and low emitter-base capacitance $(\\mathbf{C}_{\\mathbf{BE}})$ which allows for wide emitter devices essential for high power density PA designs through improved emitter utilization. Load-pull measurements of HBTs with $\\mathbf{W}_{\\mathbf{E}}=1.2\\mu m$ show ~1.5dB higher gain at 5.8GHz for a ~17% smaller footprint compared to $\\text{W}_{\\text{E}}=0.8\\mu m$ HBT (for a fixed emitter area). However, smaller footprint increases thermal resistance which degrades ruggedness. Simulations show that the ruggedness can be recovered through power cell layout optimization or by using emitter ballasting techniques. This paper also shows the importance of good mutual heating model between devices for first pass design success and reduced design cycle time.","PeriodicalId":272808,"journal":{"name":"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Impact of Emitter Width Scaling on Performance and Ruggedness of SiGe HBTs for PA Applications\",\"authors\":\"S. Sirohi, V. Jain, Ajay Raman, B. T. Nukala, Elanchezhian Veeramani, J. Adkisson, A. Joseph\",\"doi\":\"10.1109/BCICTS.2018.8551054\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present performance and ruggedness trade-offs for the different emitter widths of SiGe HBTs using GLOBALFOUNDRIES 1K5PAXE technology for power amplifier (PA) applications. The technology offers HBTs with low intrinsic base resistance (RBI) and low emitter-base capacitance $(\\\\mathbf{C}_{\\\\mathbf{BE}})$ which allows for wide emitter devices essential for high power density PA designs through improved emitter utilization. Load-pull measurements of HBTs with $\\\\mathbf{W}_{\\\\mathbf{E}}=1.2\\\\mu m$ show ~1.5dB higher gain at 5.8GHz for a ~17% smaller footprint compared to $\\\\text{W}_{\\\\text{E}}=0.8\\\\mu m$ HBT (for a fixed emitter area). However, smaller footprint increases thermal resistance which degrades ruggedness. Simulations show that the ruggedness can be recovered through power cell layout optimization or by using emitter ballasting techniques. This paper also shows the importance of good mutual heating model between devices for first pass design success and reduced design cycle time.\",\"PeriodicalId\":272808,\"journal\":{\"name\":\"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"volume\":\"56 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/BCICTS.2018.8551054\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCICTS.2018.8551054","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

我们使用GLOBALFOUNDRIES 1K5PAXE技术为功率放大器(PA)应用提供了SiGe hbt的不同发射极宽度的性能和坚固性权衡。该技术提供了具有低固有基极电阻(RBI)和低发射极基极电容$(\mathbf{C}_{\mathbf{BE}})$的hbt,通过提高发射极利用率,可以实现高功率密度PA设计所需的宽发射极器件。与$\mathbf{W}_{\mathbf{E}}=1.2\mu m$ HBT相比,$\mathbf{E}}=0.8\mu m$ HBT的负载-拉力测量结果显示,在5.8GHz下,增益提高了1.5dB,占用面积减少了17%(对于固定发射极区域)。然而,较小的占地面积增加了热阻,从而降低了坚固性。仿真结果表明,通过优化电池布局或采用发射极压流技术可以恢复电池的坚固性。本文还说明了良好的器件间互热模型对初次设计成功和缩短设计周期的重要性。
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Impact of Emitter Width Scaling on Performance and Ruggedness of SiGe HBTs for PA Applications
We present performance and ruggedness trade-offs for the different emitter widths of SiGe HBTs using GLOBALFOUNDRIES 1K5PAXE technology for power amplifier (PA) applications. The technology offers HBTs with low intrinsic base resistance (RBI) and low emitter-base capacitance $(\mathbf{C}_{\mathbf{BE}})$ which allows for wide emitter devices essential for high power density PA designs through improved emitter utilization. Load-pull measurements of HBTs with $\mathbf{W}_{\mathbf{E}}=1.2\mu m$ show ~1.5dB higher gain at 5.8GHz for a ~17% smaller footprint compared to $\text{W}_{\text{E}}=0.8\mu m$ HBT (for a fixed emitter area). However, smaller footprint increases thermal resistance which degrades ruggedness. Simulations show that the ruggedness can be recovered through power cell layout optimization or by using emitter ballasting techniques. This paper also shows the importance of good mutual heating model between devices for first pass design success and reduced design cycle time.
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