在InP衬底上生长出高质量的晶格错配In/sub 0.82/Ga/sub 0.18/As层

S. Durel, J. Caulet, M. Gauneau, B. Lambert, A. Le Corre, A. Poudoulec, D. Lecrosnier
{"title":"在InP衬底上生长出高质量的晶格错配In/sub 0.82/Ga/sub 0.18/As层","authors":"S. Durel, J. Caulet, M. Gauneau, B. Lambert, A. Le Corre, A. Poudoulec, D. Lecrosnier","doi":"10.1109/ICIPRM.1990.203004","DOIUrl":null,"url":null,"abstract":"The improvement resulting from the use of a graded buffer layer in the quality of In/sub 0.82/Ga/sub 0.18/As layers grown on an InP substrate is reported. Results of Hall effect measurements and of transmission electron microscopy, X-ray diffraction studies, and photoluminescence studies are described. For a graded buffer layer thicker than 2 mu m, Hall mobility values as high as 20300 cm/sup 2/ V/sup -1/ s/sup -1/ have been measured at room temperature with a dislocation density of about 5*10/sup 6/ cm/sup -2/.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High quality lattice-mismatched In/sub 0.82/Ga/sub 0.18/As layer grown on InP substrate\",\"authors\":\"S. Durel, J. Caulet, M. Gauneau, B. Lambert, A. Le Corre, A. Poudoulec, D. Lecrosnier\",\"doi\":\"10.1109/ICIPRM.1990.203004\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The improvement resulting from the use of a graded buffer layer in the quality of In/sub 0.82/Ga/sub 0.18/As layers grown on an InP substrate is reported. Results of Hall effect measurements and of transmission electron microscopy, X-ray diffraction studies, and photoluminescence studies are described. For a graded buffer layer thicker than 2 mu m, Hall mobility values as high as 20300 cm/sup 2/ V/sup -1/ s/sup -1/ have been measured at room temperature with a dislocation density of about 5*10/sup 6/ cm/sup -2/.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203004\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203004","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

本文报道了在InP衬底上生长的in /sub 0.82/Ga/sub 0.18/As层的质量由于使用渐变缓冲层而得到的改善。描述了霍尔效应测量和透射电子显微镜、x射线衍射研究和光致发光研究的结果。对于厚度大于2 μ m的分级缓冲层,在室温下测得的霍尔迁移率值高达20300 cm/sup 2/ V/sup -1/ s/sup -1/,位错密度约为5*10/sup 6/ cm/sup -2/。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
High quality lattice-mismatched In/sub 0.82/Ga/sub 0.18/As layer grown on InP substrate
The improvement resulting from the use of a graded buffer layer in the quality of In/sub 0.82/Ga/sub 0.18/As layers grown on an InP substrate is reported. Results of Hall effect measurements and of transmission electron microscopy, X-ray diffraction studies, and photoluminescence studies are described. For a graded buffer layer thicker than 2 mu m, Hall mobility values as high as 20300 cm/sup 2/ V/sup -1/ s/sup -1/ have been measured at room temperature with a dislocation density of about 5*10/sup 6/ cm/sup -2/.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Expertise, optimisation and control of InP and related technologies by scanning photoluminescence measurements Dislocation density after S-diffusion into p-type InP substrates Surface recombination and high efficiency in InP solar cells Molecular beam epitaxial growth techniques for graded-composition InGaAlAs/InP alloys Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1