CD-TEM在EDS断层成像中的扩展

2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Pub Date : 2019-05-01 DOI:10.1109/ASMC.2019.8791804

F. Baumann, Brian Popielarski, Yinggang Lu

{"title":"CD-TEM在EDS断层成像中的扩展","authors":"F. Baumann, Brian Popielarski, Yinggang Lu","doi":"10.1109/ASMC.2019.8791804","DOIUrl":null,"url":null,"abstract":"We show how a CD-TEM (Critical Dimension- Transmission Electron Microscope) can be used to acquire EDS (Energy Dispersive X-ray Spectroscopy) tomograms, which allow chemical mapping in 3D for most elements in the sample. This is achieved by developing a recipe using ordinary commands also used in CD-TEM programming.","PeriodicalId":287541,"journal":{"name":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Extension of CD-TEM towards EDS Tomography\",\"authors\":\"F. Baumann, Brian Popielarski, Yinggang Lu\",\"doi\":\"10.1109/ASMC.2019.8791804\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We show how a CD-TEM (Critical Dimension- Transmission Electron Microscope) can be used to acquire EDS (Energy Dispersive X-ray Spectroscopy) tomograms, which allow chemical mapping in 3D for most elements in the sample. This is achieved by developing a recipe using ordinary commands also used in CD-TEM programming.\",\"PeriodicalId\":287541,\"journal\":{\"name\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2019.8791804\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2019.8791804","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

我们展示了如何使用CD-TEM(关键尺寸-透射电子显微镜)获得EDS(能量色散x射线光谱)层析图，这使得样品中的大多数元素可以在3D中进行化学绘图。这是通过使用CD-TEM编程中也使用的普通命令开发一个配方来实现的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

Extension of CD-TEM towards EDS Tomography

We show how a CD-TEM (Critical Dimension- Transmission Electron Microscope) can be used to acquire EDS (Energy Dispersive X-ray Spectroscopy) tomograms, which allow chemical mapping in 3D for most elements in the sample. This is achieved by developing a recipe using ordinary commands also used in CD-TEM programming.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

自引率

0.00%

发文量

期刊最新文献

Fast and accurate defect classification for CMP process monitoring A Deep Learning Model for Identification of Defect Patterns in Semiconductor Wafer Map The Etching of Silicon Nitride in Phosphoric Acid with Novel Single Wafer Processor Methods for RFSOI Damascene Tungsten Contact Etching Using High-Speed Video Analysis for Defect Investigation and Process Improvement