一种低成本水平电流双极晶体管(HCBT)技术,用于BiCMOS与finfet的集成

T. Suligoj, Haitao Liu, J. Sin, K. Tsui, K.J. Chen, P. Biljanovic, K. Wang
{"title":"一种低成本水平电流双极晶体管(HCBT)技术,用于BiCMOS与finfet的集成","authors":"T. Suligoj, Haitao Liu, J. Sin, K. Tsui, K.J. Chen, P. Biljanovic, K. Wang","doi":"10.1109/ISDRS.2003.1272372","DOIUrl":null,"url":null,"abstract":"In this paper, we present a scaled transistor processed with the improved technology, resulting in the enhancement of its electrical performance. The electrical characteristics such as collector-emitter breakdown, charge sharing of the processed transistor is presented. The electrical properties of HCBTs are compared with the existing LBTs (Lateral Bipolar Transistors). This HCBT technology was applied in the BiCMOS integration with FinFETs.","PeriodicalId":369241,"journal":{"name":"International Semiconductor Device Research Symposium, 2003","volume":"207 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"A low-cost Horizontal Current Bipolar Transistor (HCBT) technology for the BiCMOS integration with FinFETs\",\"authors\":\"T. Suligoj, Haitao Liu, J. Sin, K. Tsui, K.J. Chen, P. Biljanovic, K. Wang\",\"doi\":\"10.1109/ISDRS.2003.1272372\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we present a scaled transistor processed with the improved technology, resulting in the enhancement of its electrical performance. The electrical characteristics such as collector-emitter breakdown, charge sharing of the processed transistor is presented. The electrical properties of HCBTs are compared with the existing LBTs (Lateral Bipolar Transistors). This HCBT technology was applied in the BiCMOS integration with FinFETs.\",\"PeriodicalId\":369241,\"journal\":{\"name\":\"International Semiconductor Device Research Symposium, 2003\",\"volume\":\"207 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-12-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Semiconductor Device Research Symposium, 2003\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISDRS.2003.1272372\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Semiconductor Device Research Symposium, 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISDRS.2003.1272372","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

在本文中,我们提出了一个用改进的技术加工的晶体管,从而提高了它的电性能。给出了该晶体管的集电极-发射极击穿、电荷共享等特性。将HCBTs的电学性能与现有的lbt (Lateral Bipolar transistor)进行了比较。该HCBT技术应用于BiCMOS与finfet的集成。
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A low-cost Horizontal Current Bipolar Transistor (HCBT) technology for the BiCMOS integration with FinFETs
In this paper, we present a scaled transistor processed with the improved technology, resulting in the enhancement of its electrical performance. The electrical characteristics such as collector-emitter breakdown, charge sharing of the processed transistor is presented. The electrical properties of HCBTs are compared with the existing LBTs (Lateral Bipolar Transistors). This HCBT technology was applied in the BiCMOS integration with FinFETs.
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