扫描探针显微镜热分析[CMOS ic]

L. Balk, R. M. Cramer, G.B.M. Fiege
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引用次数: 5

摘要

最先进的集成器件的横向尺寸不断减小,导致其功率密度稳步增加。因此,已知局部加热效应会导致这些设备的故障或破坏。为了克服这些与局部散热有关的问题,必须开发具有高空间分辨率的热分析新技术。这包括温度以及热导率或扩散率的测量。在这项工作中,我们讨论了基于扫描探针显微镜的热分析技术的最新进展,并提出了进一步改进的概念。
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Thermal analyses by means of scanning probe microscopy [CMOS ICs]
The continuous decrease of the lateral dimensions of state-of-the-art integrated devices has led to a steady increase of their power densities. As a result, local heating effects are known to cause malfunctions or the destruction of these devices. In order to overcome these problems related with localized heat dissipation, new techniques for thermal analyses with high spatial resolutions have to be developed. This includes temperature as well as thermal conductivity or diffusivity measurements. In this work we discuss the recent progress of scanning probe microscopy based thermal analysis techniques and present concepts for further improvements.
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